“…In the first case, the ability of GaN/AlN SLs with a period of several atomic layers to possess a precisely adjusted effective band gap from 3.4 to 6.1 eV can be used in light-emitting and adsorption layers instead of traditional ternary AlGaN alloys [ 1 , 2 , 3 , 4 , 5 , 6 , 7 ]. GaN/Al(Ga)N SLs with a slightly longer period are a promising material system for the implementation of unipolar devices operating in the range from the near IR to the THz one [ 8 , 9 , 10 , 11 ]. Moreover, the introduction of different SLs into all heterostructure devices grown on mismatched substrates is very effective for controlling stresses and filtering threading dislocations [ 12 , 13 , 14 ].…”