This paper reports an approach for the generation of molybdenum disulfide nanostructures by the sulfidation of patterned sub-300 nm features of molybdenum metal. Our method can be used to pattern arbitrary shapes of MoS 2 nanostructures with independent control over their width, height, and length. In addition, we can control the orientation of the crystals by placing the patterned substrates at different locations in the quartz tube furnace. These nanostructures can be fabricated with variable pitch, over large areas (cm 2 ), and on a range of insulating and conducting substrates (e.g., sapphire, fused silica, and silicon). This work provides a general strategy for patterning nanoscale crystalline structures on surfaces-in particular, metal sulfide nanomaterials-by combining topdown nanoscale patterning techniques with bottom-up chemical methods.MoS 2 is a layered semiconducting material that has shown promise in chemical sensors, [1] in solar cells, [2] in catalysis, [3][4][5] and for low-friction surfaces. [6][7][8] Recent studies have suggested that reducing the size of the MoS 2 crystals can improve their lubrication properties in bearings, O-rings, or other heavy-wear applications.[9] The ability to pattern MoS 2 nanostructures and other metal-sulfide materials on surfaces with specific sizes and shapes has the potential to optimize and improve their usefulness. MoS 2 ribbons have successfully been grown on the step edges of highly oriented pyrolytic graphite by electrochemical methods. [10,11] Although the heating of MoO 2 nanowires in H 2 S for several days could achieve increased lateral dimensions of MoS 2 ribbons, control of other aspects of this system, such as the height, the spacing, and the overall length of the ribbons, remains a challenge. There are two strategies for organizing nanostructures on surfaces: i) synthesis of the nanomaterials followed by assembly into architectures, or ii) direct growth of the nanostructures at predefined locations. The former approach relies on assembly methods such as fluidic-based assembly, [12,13] electric-and magnetic-field-mediated assembly, [14][15][16] electrostatic assembly, [17,18] and template-based assembly. [19,20] Serial lithographic techniques, including scanning-probe and electronbeam (e-beam) writing, can easily pattern functional structures with sub-100 nm features; however, their slow write speeds and small write areas can be a drawback. [21][22][23] Examples of parallel patterning methods are nanosphere lithography and laser-assisted embossing, which can generate sub-100 nm patterns of simple geometries. [24,25] We and others have developed a suite of soft-lithographic nanopatterning tools that can generate small (sub-30 nm) features over relatively large areas (> 1 cm 2 ) in a parallel process. [26,27] These tools have been used to create Si and GaAs nanostructures by chemical etching [28,29] and to direct the growth of arrays of ZnO nanowires and carbon nanotubes. [30][31][32] Here we report an important variant of the directed-growth method: ...