A generic method for equipping arbitrary rf discharge simulation frameworks with external lumped element circuits

Schmidt, Frederik; Trieschmann, Jan; Gergs, Tobias; Mussenbrock, Thomas

doi:10.1063/1.5091965

Cited by 9 publications

(3 citation statements)

References 19 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Recently, a generalized method to simulate CCP and external matching networks together is proposed by Schmidt [76,104]. The voltage across the electrode usually changes significantly, so the simulation of the breakdown process must be coupled to an external circuit model, as has been demonstrated by previous results of others and our preliminary results.…”

Section: Future Trends Of Previous Mrf Breakdown Modelsmentioning

confidence: 71%

“…Many works have shown that the external circuit plays an important role in protecting the power cabinet and adjusting the power matching. In previous theoretical studies, by simplifying the external circuit [16,[71][72][73], the plasma properties can be studied, but the effect of the plasma on the complex matching circuit cannot be studied; by simplifying the plasma as a network of capacitors, resistors and inductors [74][75][76][77], the characteristics of power matching under complex matching circuits can be studied, but the effects of matching circuits on plasma cannot be studied self-consistently.…”

Section: Theoretical and Numerical Research Into Mrf Breakdownmentioning

confidence: 99%

See 1 more Smart Citation

Gas breakdown in radio-frequency field within MHz range: a review of the state of the art

Jiang¹,

Wu²,

Wang³

et al. 2022

Plasma Sci. Technol.

View full text Add to dashboard Cite

Low-temperature plasmas (LTPs) driven by 1-100 MHz radio-frequency (MRF) is essential for many industrial applications, and their breakdown characteristics are different from direct current (DC) breakdown. This review seeks to understand the state of the art of electric breakdown in the MRF field and provide references for related basic and applied research. We have given a brief history of the research of MRF-driven breakdown, including the Paschen curves, the corresponding discharge modes and parameter spaces, and the evolution of the parameters during the breakdown process. It is shown that the focus has been transferred from the breakdown voltage and V-I characters to the evolution of plasma parameters during the breakdown, both in experiments and simulations. It is shown that many fundamental and applied problems still need to be investigated, especially with the new global model and incorporating the external circuit model.

show abstract

Section: Future Trends Of Previous Mrf Breakdown Modelsmentioning

confidence: 71%

Section: Theoretical and Numerical Research Into Mrf Breakdownmentioning

confidence: 99%

Gas breakdown in radio-frequency field within MHz range: a review of the state of the art

Jiang¹,

Wu²,

Wang³

et al. 2022

Plasma Sci. Technol.

View full text Add to dashboard Cite

show abstract

“…In this case one can proceed similar to the ES case [55]. However, we decided to reserve the effects associated with complex external networks [79][80][81] for a separate study and consider here only a simple external network with a single blocking capacitor of capacitance C. In this case of an unmatched reactor load, the total plasma impedance is dominated by the capacitive sheaths. It causes only a relatively small fraction of the incoming power to be absorbed by the plasma bulk, and a large fraction of the power produced by the generator to be reflected back.…”

Section: Em Pic Modelmentioning

confidence: 99%

Modeling of very high frequency large-electrode capacitively coupled plasmas with a fully electromagnetic particle-in-cell code

Eremin

Kemaneci

Matsukuma

et al. 2023

Plasma Sources Sci. Technol.

Self Cite

View full text Add to dashboard Cite

Phenomena taking place in capacitively coupled plasmas with large electrodes and driven at very high frequencies are studied numerically utilizing a novel energy- and charge-conserving implicit fully electromagnetic particle-in-cell / Monte Carlo code ECCOPIC2M. The code is veriﬁed with three model problems and is validated with results obtained in an earlier experimental work [1]. The code shows a good agreement with the experimental data in four diﬀerent cases with various collisionality and absorbed power. It is demonstrated that under the considered parameters the discharge produces radially uniform ion energy distribution functions for the ions hitting both electrodes, whereas ion ﬂuxes exhibit a strong radial nonuniformity, which, however, can be diﬀerent at the powered and grounded electrodes at an increased pressure. It is found that this nonuniformity stems from the nonuniformity of the ionization source, which in turn is shaped by mechanisms leading to the generation of energetic electrons. The mechanisms are caused by interaction of electrons with the surface waves of two diﬀerent axial electric ﬁeld symmetry types with respect to the reactor midplane. The asymmetric modes dominate electron heating in the radial direction and produce energetic electrons via the relatively ineﬃcient Ohmic heating mechanism. In the axial direction the electron energization occurs mainly through an eﬃcient collionless mechanism caused by interaction of electrons in the vicinity of an expanding sheath with the sheath motion, which is aﬀected by the excitation of the surface modes of both types. Generation of energetic electron populations as a result of such mechanisms is shown directly. Although some aspects of the underlying physics were demonstrated in the previous literature with other models, the particle-in-cell method is advantageous for the predictive modeling due to a complex interplay between the surface mode excitations and the nonlocal physics of the corresponding type of plasma discharges operated at low pressures, which is hard to reproduce in other models realistically.

show abstract

Influence of Matching Network on the Discharge Characteristic of Dual—Frequency Capacitively Coupled Ar Plasma

Yuan,

Shan,

Yin

et al. 2024

Contrib. Plasma Phys

View full text Add to dashboard Cite

This paper examines the impact of different type external matching networks on the discharge characteristics of dual‐frequency capacitively coupled plasma. A nonlinear global model is employed to analyze the discharge of dual‐frequency capacitively coupled argon plasma, with a low frequency of 8 MHz and 60 W and a high frequency of 100 MHz at 10–80 W. Discharge voltage waveforms, current waveforms, and emission spectra of the plasma were measured, while electron density and electron temperature were determined using the Boltzmann method. The electron density and electron temperature are utilized as input parameters for the nonlinear global model, while the plasma discharge is simulated with a fixed low‐frequency radio frequency (RF) source power (60 W) and a varied high‐frequency RF source power ranging from 10 to 80 W. The results indicate that the plasma discharge current, sheath capacitance, plasma resistance, plasma inductance, and the ratio of stochastic heating to Ohmic heating increase, while the sheath thickness decreases with increasing power. It is also found that the fundamental frequency current as well as 12th and 13th harmonic currents in the plasma are caused by the matching network and the nonlinear interaction between the sheath and the plasma. An optimal matching network can be designed to eliminate the effects of the harmonics and to meet industrial requirements for discharge uniformity.

show abstract

A generic method for equipping arbitrary rf discharge simulation frameworks with external lumped element circuits

Cited by 9 publications

References 19 publications

Gas breakdown in radio-frequency field within MHz range: a review of the state of the art

Gas breakdown in radio-frequency field within MHz range: a review of the state of the art

Modeling of very high frequency large-electrode capacitively coupled plasmas with a fully electromagnetic particle-in-cell code

Influence of Matching Network on the Discharge Characteristic of Dual—Frequency Capacitively Coupled Ar Plasma

Contact Info

Product

Resources

About