A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography
Aris Magklaras,
Panayiotis Alefragis,
Christos Gogos
et al.
Abstract:In photolithographic processes, nanometer-level-precision wavefront-aberration models enable the machine to be able to meet the overlay (OVL) drift and critical dimension (CD) specifications. Software control algorithms take as input these models and correct any expected wavefront imperfections before reaching the wafer. In such way, a near-optimal image is exposed on the wafer surface. Optimizing the parameters of these models, however, involves several time costly sensor measurements which reduce the through… Show more
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