A Geometrically Scalable Lumped Model for Spiral Inductors in Radio Frequency GaN Technology on Silicon

Abstract

This paper presents a lumped scalable model for spiral inductors in a radio frequency (RF) gallium nitride (GaN) technology on silicon substrate. The model has been developed by exploiting electromagnetic (EM) simulations of geometrically scaled spiral inductors. To this aim, the technology substrate, i.e., the metal back-end-of-line along with dielectric and semiconductor layers of the adopted GaN process, has been validated by means of experimental data and then used to define the EM simulator set-up for the spiral inductors. The proposed model adopts a simple π-topology with only seven lumped components and predicts inductor performance in terms of inductance, quality factor (Q-factor) and self-resonance frequency (SRF) for a large range of geometrical parameters of the spiral (i.e., number of turns, metal width, inner diameter).