A gray matching method for cylindrical lens array fabrication based on DMD lithography

Zhang, Hengxu; Li, Zhe; Wu, Boqi; Dong, L.; Sun, Yanjun; Leng, Yanbing; Wang, Li

doi:10.1109/3m-nano.2016.7824952

Cited by 3 publications

(1 citation statement)

References 12 publications

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“…If the SU-8 thickness is greater than the DOF, the spatial resolution rate will be reduced, and the actual and design profiles may contain errors, thereby reducing the exposure quality. The DOF is defined by equation (1) [28],…”

Section: Methodsmentioning

confidence: 99%

Multi-layer lithography using focal plane changing for SU-8 microstructures

Chen

Zhou

Zheng

et al. 2020

Mater. Res. Express

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In this paper, we report on a type of SU-8 microstructure with vertical sidewalls used for polydimethydiloxane (PDMS) microchannels. Multi-layer lithography using focal plane changing approach is proposed to expose the SU-8 photoresist based on a digital micromirror device (DMD) maskless lithography system. We used a light-emitting diode source with a wavelength of 405 nm. The thickness of the SU-8 is divided into multi-layers according to the depth of focus. Each layer corresponds to a depth of focus, and then, a virtual mask is designed for the layer. Finally, each layer is exposed to changes in the focal plane. The results indicate that the actual profile of the SU-8 mold shows good agreement with the design profile without any T-profiles. Additionally, there is better linewidth in the proposed method compared with multi-exposure by a single fixed focal plane. The PDMS microchannels result also demonstrate the stability of the SU-8 mold.

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Section: Methodsmentioning

confidence: 99%

Multi-layer lithography using focal plane changing for SU-8 microstructures

Chen

Zhou

Zheng

et al. 2020

Mater. Res. Express

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Cylindrical electrochemical sensor fabricated by rotated inkjet printing on flexible substrate for glucose monitoring

Zhang

et al. 2017

2017 19th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS)

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Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review

Khonina,

Kazanskiy,

Butt

2024

Micromachines

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Lithography serves as a fundamental process in the realms of microfabrication and nanotechnology, facilitating the transfer of intricate patterns onto a substrate, typically in the form of a wafer or a flat surface. Grayscale lithography (GSL) is highly valued in precision manufacturing and research endeavors because of its unique capacity to create intricate and customizable patterns with varying depths and intensities. Unlike traditional binary lithography, which produces discrete on/off features, GSL offers a spectrum of exposure levels. This enables the production of complex microstructures, diffractive optical elements, 3D micro-optics, and other nanoscale designs with smooth gradients and intricate surface profiles. GSL plays a crucial role in sectors such as microelectronics, micro-optics, MEMS/NEMS manufacturing, and photonics, where precise control over feature depth, shape, and intensity is critical for achieving advanced functionality. Its versatility and capacity to generate tailored structures make GSL an indispensable tool in various cutting-edge applications. This review will delve into several lithographic techniques, with a particular emphasis on masked and maskless GSL methods. As these technologies continue to evolve, the future of 3D micro- and nanostructure manufacturing will undoubtedly assume even greater significance in various applications.

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A gray matching method for cylindrical lens array fabrication based on DMD lithography

Cited by 3 publications

References 12 publications

Multi-layer lithography using focal plane changing for SU-8 microstructures

Multi-layer lithography using focal plane changing for SU-8 microstructures

Cylindrical electrochemical sensor fabricated by rotated inkjet printing on flexible substrate for glucose monitoring

Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review

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