Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.
DOI: 10.1109/ispsd.2005.1487977
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A high performance Complementary Bipolar Process controlling Base poly-Si Over-Etching in emitter region and using SOI or PBSOI technique

J.H. Kim1,
S.H. Lee2,
H.J. Park3
et al.
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