2011
DOI: 10.1109/jsen.2010.2052799
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A High-Performance n-i-p SiCN Homojunction for Low-Cost and High-Temperature Ultraviolet Detecting Applications

Abstract: In this paper, ultraviolet (UV) detecting performances of the n-i-p SiCN homojunction prepared on a p-type (100) silicon substrate under room and elevated temperatures were studied. We analyze the morphology and structure of the crystalline SiCN film on Si first and then examine responses of the sensors to UV light by measurement of photo/dark current ratio with and without the irradiation of a 254-nm UV light. The current ratios of the homojunction under 5 bias, with and without irradiation of a 254-nm UV lig… Show more

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Cited by 16 publications
(6 citation statements)
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“…The current ratio for 254 nm UV light was about 6.5 at RT and 2.3 at 200 °C. With effective doping both in p -type and n -type, the n-i-p anb n-p SiCN homojunction UV detectors on Si substrate by using the same method also demonstrated good performances [143]. The photo to dark current ratios of the homojunction under −5 V, with and without irradiation of a 254 nm UV light were 3,180 and 135.65, respectively, at RT and 200 °C.…”
Section: Semiconductor Thin-film Uv Photodetectormentioning
confidence: 99%
“…The current ratio for 254 nm UV light was about 6.5 at RT and 2.3 at 200 °C. With effective doping both in p -type and n -type, the n-i-p anb n-p SiCN homojunction UV detectors on Si substrate by using the same method also demonstrated good performances [143]. The photo to dark current ratios of the homojunction under −5 V, with and without irradiation of a 254 nm UV light were 3,180 and 135.65, respectively, at RT and 200 °C.…”
Section: Semiconductor Thin-film Uv Photodetectormentioning
confidence: 99%
“…This novel metallic composite material might be one of the greatest possibilities for future metal-based nano-structural device development, but it requires more research into nano-grating structure design and modeling for MSM-PDs as this contains a volumetric fraction of SiC. For the development of high current/temperature-driven modern optoelectronic devices, SiC and SiC-based materials are found to be highly recommended in the literature [79][80][81][82][83]. This new type of However, putting this double layer nano-grating structure device into practice will be difficult owing to the disadvantages of employing silver as a top metal layer for any multilayer structure due to its rapid oxidation and surface deterioration.…”
Section: Advance States Of Simulated Results and Discussionmentioning
confidence: 99%
“…Compared to the conventional DLC deposition methods, such as ion deposition, sputtering, pulsed laser deposition, microwave plasma-enhanced or electron cyclotron resonance 1530-437X/$26.00 © 2011 IEEE chemical vapor deposition, RTCVD would be more suitable for mass production because RTCVD can effectively grow thin film under the suitable temperature within a short time, thus lowering the cost with low thermal budget [8].…”
Section: A Film Preparationmentioning
confidence: 99%