This paper proposes a new technology for slow wave microstrip lines based on a low-cost metallic-nanowire filled-membrane substrate (MnM-substrate). These transmission lines can operate from RF to millimeter-wave frequencies. The MnM-substrate consists in a dielectric material containing vertical metallic nanowires connected to a bottom ground plane. The innovative concept of the slow-wave microstrip lines on MnM-substrate is presented, as well as the electromagnetic considerations, fabrication process, and measurement results.Initial results show high relative dielectric constants (up to 43).Hence, it is possible to reach high-quality factor transmission lines within a great range of impedances, from 20 to 100 n, without critical dimensions.