2014
DOI: 10.1002/mawe.201400210
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A low‐cost dehydrogenation system of amorphous silicon thin films used for fabricating low‐temperature polycrystalline silicon

Abstract: Low-temperature polycrystalline silicon thin-film transistors were widely employed in active-matrix flat-panel displays and giant microelectronics. In general, a-Si thin films prepared by plasma-enhanced chemical vapor deposition contain hydrogen. To prevent the ablation caused by sudden hydrogen eruption during excimer laser crystallization (ELC), two dehydrogenation systems are developed in this study to reduce hydrogen content before excimer laser crystallization. One is a ceramic heater-based dehydrogenati… Show more

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Cited by 1 publication
(2 citation statements)
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“…Several methods have been proposed for a dehydrogenation process to improve the issues of the conventional thermal annealing methods [7][8][9][10]. There are some required characteristics and performance for high-efficiency dehydrogenation systems, such as low damage to substrate, fast temperature ramping-up, high throughput, and low cost.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Several methods have been proposed for a dehydrogenation process to improve the issues of the conventional thermal annealing methods [7][8][9][10]. There are some required characteristics and performance for high-efficiency dehydrogenation systems, such as low damage to substrate, fast temperature ramping-up, high throughput, and low cost.…”
Section: Introductionmentioning
confidence: 99%
“…Despite this method decreasing annealing temperature, there are still adverse effects at manufacturing throughput problem because the additional UV illumination process prolongs the total dehydrogenation processing time. In addition, although step-bystep excimer laser annealing is an effective and promising candidate for dehydrogenation method [9]. This method is a cost-ineffective, lower ramping-up speed, and limited extension of the system size due to its small illumination spot.…”
Section: Introductionmentioning
confidence: 99%