“…26 Numerous deposition techniques have been investigated for producing Cu 2 O thin films, including Chemical Vapor Deposition (CVD), 27 Metal-Organic Chemical Vapor Deposition (MOCVD), 28 thermal evaporation, 29 and sputtering. [30][31][32][33] In the present study, the emphasis is placed on utilizing a plasma focusing device (PFD) for the deposition of Cu 2 O thin films, attributed to the numerous advantages it proffers, such as high ion energy, localized deposition, 34 and potential for scalability, thereby presenting itself as a compelling alternative for the fabrication of superior thin films. 35 The primary objective of this research is to execute a systematic investigation into the effects of deposition parameters, with a specific emphasis on plasma focusing shots and the structural and optoelectronic properties of the Cu 2 O thin films.…”