2013
DOI: 10.4218/etrij.13.0212.0559
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A Low-Delay MDCT/IMDCT

Abstract: This letter presents an algorithm for selecting a low delay for the modified discrete cosine transform (MDCT) and inverse MDCT (IMDCT). The implementation of conventional MDCT and IMDCT requires a 50% overlap‐add (OLA) for a perfect reconstruction. In the OLA process, an algorithmic delay in the frame length is employed. A reduced overlap window and MDCT/IMDCT phase shifting is used to reduce the algorithmic delay. The performance of the proposed algorithm is evaluated by applying the low‐delay MDCT to the G. … Show more

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(1 citation statement)
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“…26 Numerous deposition techniques have been investigated for producing Cu 2 O thin films, including Chemical Vapor Deposition (CVD), 27 Metal-Organic Chemical Vapor Deposition (MOCVD), 28 thermal evaporation, 29 and sputtering. [30][31][32][33] In the present study, the emphasis is placed on utilizing a plasma focusing device (PFD) for the deposition of Cu 2 O thin films, attributed to the numerous advantages it proffers, such as high ion energy, localized deposition, 34 and potential for scalability, thereby presenting itself as a compelling alternative for the fabrication of superior thin films. 35 The primary objective of this research is to execute a systematic investigation into the effects of deposition parameters, with a specific emphasis on plasma focusing shots and the structural and optoelectronic properties of the Cu 2 O thin films.…”
Section: Introductionmentioning
confidence: 99%
“…26 Numerous deposition techniques have been investigated for producing Cu 2 O thin films, including Chemical Vapor Deposition (CVD), 27 Metal-Organic Chemical Vapor Deposition (MOCVD), 28 thermal evaporation, 29 and sputtering. [30][31][32][33] In the present study, the emphasis is placed on utilizing a plasma focusing device (PFD) for the deposition of Cu 2 O thin films, attributed to the numerous advantages it proffers, such as high ion energy, localized deposition, 34 and potential for scalability, thereby presenting itself as a compelling alternative for the fabrication of superior thin films. 35 The primary objective of this research is to execute a systematic investigation into the effects of deposition parameters, with a specific emphasis on plasma focusing shots and the structural and optoelectronic properties of the Cu 2 O thin films.…”
Section: Introductionmentioning
confidence: 99%