Abstract:A compact monolithic RF-MEMS switch (2 mm×4 mm in area) with the dual single-pole-double-throw (SPDT) configuration was developed by using the SOI bulk micromachining technique. The electrostatic comb-drive actuators and the mechanically movable coplanar waveguides were implemented on the low-resistive active SOI layer and the high-resistive handle layer, respectively, to effectively allocate the device footprint. Electrical crosstalk between the waveguide and the electrostatic actuator was suppressed by using the buried silicon dioxide layer. At a driving voltage of 35 V, the switch exhibits an insertion loss of 3 dB and isolation of 30 dB at 12 GHz. Keywords: RF-MEMS switch, SOI wafer, layer-wise layout, electroplating, electrostatic actuator, laterally actuated Classification: Micro-or nano-electromechanical systems