2020
DOI: 10.1088/1361-6595/ab9b32
|View full text |Cite
|
Sign up to set email alerts
|

A method for measuring plasma parameters and dielectric film thickness by analyzing transient voltages for deposition plasma processing monitoring

Abstract: An electrical method is proposed to measure the dielectric lm thickness, electron temperature, and plasma density for deposition plasmas. In this method, a square voltage is applied to a at probe coated with a dielectric lm, and the transient voltage of a series capacitor connected to the probe is measured. The thickness of the dielectric lm is obtained from the transient voltage because the applied voltage is divided across the dielectric lm and the series capacitor. The deposited dielectric lm causes a chang… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2021
2021
2021
2021

Publication Types

Select...
1

Relationship

1
0

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 32 publications
0
1
0
Order By: Relevance
“…Hwang et al measured the electron temperature using the floating potential difference by applying AC voltage to the probe tip and the ion density using the first harmonic current [7]. In recent work, we suggested the method of applying the square voltages to the probe tip and analysed the transient voltage of the capacitor connected in series to the probe for obtaining the electron temperature and ion density [8,9].…”
Section: Introductionmentioning
confidence: 99%
“…Hwang et al measured the electron temperature using the floating potential difference by applying AC voltage to the probe tip and the ion density using the first harmonic current [7]. In recent work, we suggested the method of applying the square voltages to the probe tip and analysed the transient voltage of the capacitor connected in series to the probe for obtaining the electron temperature and ion density [8,9].…”
Section: Introductionmentioning
confidence: 99%