A method for measuring two‐dimensional refractive index distribution by using Fresnel equations and phase‐shifting interferometry

Hsieh, Hung-Chih; Jian, Zhi Cheng; Chen, Y. L.; Hsieh, Pao-Ju; Su, Der‐Chin

doi:10.1002/pssc.200777735

Cited by 3 publications

(1 citation statement)

References 14 publications

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“…The first, which is widely used in phase-stepping interferometers with monochromatic or narrowband light, is to generate a dynamic phase shift by changing the path length difference between two wavefronts [13]. Ellipsometers exploiting this particular approach have been demonstrated using an electrooptic modulator as the phase shifter and a He-Ne laser as the source [14,15].…”

Section: Introductionmentioning

confidence: 99%

White-light ellipsometer with geometric phase shifter

Watkins

Derbois

2012

Appl. Opt.

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We describe a simple spectroscopic ellipsometer that uses a geometric phase shifter and a white-light source to generate a small number of phase-stepped intensities I(λ), which are recorded by a spectrometer. The ellipsometric angles ψ and Δ are easily calculated from these intensities at each wavelength simultaneously. We show that errors in Δ due to the nonideal behavior of the achromatic quarter-wave plate in the phase shifter can be made small by suitably adjusting the azimuth of the linearly polarized light incident on the sample. Two silicon dioxide films were measured with this instrument between 450 and 850 nm and yielded best fit film thicknesses of 1000.6±0.1 Å and 20.6±0.1 Å, in excellent agreement with those obtained using a commercial ellipsometer.

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Section: Introductionmentioning

confidence: 99%

White-light ellipsometer with geometric phase shifter

Watkins

Derbois

2012

Appl. Opt.

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Effect of surface plasmon polaritons on the sensitivity of refractive index measurement using total internal reflection method

Entezar

2015

Journal of Magnetism and Magnetic Materials

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Interferometric measurement of Van Hove singularities in strained graphene

Entezar¹

2020

Appl. Opt.

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This study presents a method based on the total internal reflection and phase-shifting interferometry for measuring the Van Hove singularities in strained graphene. A linearly polarized light passes through some quarter- and half-wave plates, a hemi-cylindrical prism, and a Mach–Zehnder interferometer. The Van Hove singularities manifest themselves as some sharp dips or peaks in the spectrum of the final phase difference of the two interference signals. The numerical analysis demonstrates that the number of Van Hove singularities is independent of the modulus of the applied stress, but their position shifts as the strength of the tension increases. Moreover, the number and location of singularities strongly depend on the stress direction relative to the zigzag axis in the graphene lattice. We also show that the location of singularities is independent of the tension direction relative to the tangential component of the electric field of the incident radiation.

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A method for measuring two‐dimensional refractive index distribution by using Fresnel equations and phase‐shifting interferometry

Cited by 3 publications

References 14 publications

White-light ellipsometer with geometric phase shifter

White-light ellipsometer with geometric phase shifter

Effect of surface plasmon polaritons on the sensitivity of refractive index measurement using total internal reflection method

Interferometric measurement of Van Hove singularities in strained graphene

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