A method for the determination of the complex refractive index of non-metallic thin films using photometric measurements at normal incidence

Cisneros, J. I.; Rego, Germano B.; Tomyiama, Masahiro; Bilac, S.; Gonçalves, Juliana Rocha; Rodriguez, Alex; Arguello, Z. P.

doi:10.1016/0040-6090(83)90471-6

Cited by 49 publications

(12 citation statements)

References 13 publications

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“…The optically determined thicknesses were compared with independent measurements performed with a perfilometer (Dektak ST Profiler). The absorption coefficient of the highly absorbing, high Mn content samples were determined using the mechanically measured film thickness, the refractive index estimated from reflectance measurements [23] and the high absorption routine applied to the transmittance spectra [22] .…”

Section: Methodsmentioning

confidence: 99%

Disorder effects produced by the Mn and H incorporations on the optical absorption edge of Ga1−xMnxAs:H nanocrystalline films

Pereira¹,

Silva²

2008

Journal of Non-Crystalline Solids

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Section: Methodsmentioning

confidence: 99%

Disorder effects produced by the Mn and H incorporations on the optical absorption edge of Ga1−xMnxAs:H nanocrystalline films

Pereira¹,

Silva²

2008

Journal of Non-Crystalline Solids

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“…Refractive index values n were determined for films which were deposited from HMDSN/Ar discharges at several partial pressures. Ultraviolet-visible spectra provided the basis for the calculations, which were made according to the procedure used by Cisneros et al [20][21][22]. The value of n for photon energy of 1 eV is shown in Fig.…”

Section: Optical Propertiesrefractive Indexmentioning

confidence: 99%

Thin films growth by PIIID technique from hexamethyldisilazane/argon mixture

Kodaira

Mota

Moreira

2015

Surface and Coatings Technology

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Plasma polymer thin films are pinhole-free and have also a high cross-linked structure. These kinds of films are insoluble in mild acids and bases and present good adhesion on different materials. These features make the films relevant for industrial applications and are used in different fields such as electronics, mechanics, biomedics, electrics, protective coatings and others. The plasma polymer hexamethyldisilazane/argon films (ppHMDSN/Ar) were deposited on substrates which were placed between two stainless steel parallel plate electrodes fed by a radio-frequency source operated at 13.56 MHz and 50 W at a total pressure (HMDSN and argon) of 80 mTorr. The negative bias of 10 kV and 10 Hz pulse were used for ion implantation. The structural characterization of the films was done by FTIR spectroscopy. The contact angle for water was of approximately 98°and the surface energy of 30 mJ/m 2 which represents a hydrophobic surface, measured by goniometric method. The refractive index of these materials presents values from 1.56 to 1.64 measured by ultraviolet-visible technique. The thickness of the samples was measured by profilometry and showed values from 96 to 210 nm for different deposition conditions resulting in deposition rates from 4.8 to 10.5 nm/min. Hardness values ranging from 0.9 to 2.6 GPa were found for the films measured by nanoindentation technique.

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“…Optical properties were also studied by recording transmission spectrum over the range (200-1100) nm using Shimadzu UV-visible spectrophotometer model (1650 PC). The thicknesses of the films were determined by optical interference technique using wavelengths at maxima and minima and applying the following equations [13]:-…”

Section: Fig(1)schematic Diagram Of Cvd System For Sno2 Films Deposimentioning

confidence: 99%

Annealing Effect on Structural and Optical Properties of SnO2 Thin Films

Delaimy¹,

Basheer²

2008

J.Edu.Sci.

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‫ب‬ ‫ب‬ ‫ترس‬ ‫ب‬ ‫لرا‬ ‫حل‬ ‫ب‬ ‫ب‬ ‫ة‬ ‫توم‬ ‫بر‬ ‫ب‬ ‫ويس‬ (190-230)A . ‫ش‬ ‫ب‬ ‫ب‬ ‫ة‬ ‫ب‬ ‫ب‬ ‫تح‬ ‫ثء‬ ‫بب‬ ‫ب‬ ‫ل‬ ‫ترة‬ ‫بأ‬ ‫يي‬ ‫م‬ ‫ب‬ ‫ب‬ ‫ترن‬ ‫ع‬ ‫ب‬ ‫ب‬ ‫ترر‬ ‫بب‬ ‫ب‬ ‫ترسرةل‬ ‫تج‬ ‫ب‬ ‫ب‬ ‫نا‬ ‫ف‬ ‫وم‬ ‫ب‬ ‫ب‬ ‫ب‬ ‫تس‬ (a=b=4.782,c=3.233)A ‫و‬ ‫ب‬ ‫ب‬ ‫ب‬ ‫ال‬ ‫ث‬ ‫ب‬ ‫ب‬ ‫ب‬ ‫تس‬ ‫برا‬ ‫ب‬ ‫ب‬ ‫رسل‬ ‫ب‬ ‫ر‬ ‫ب‬ ‫ب‬ ‫ب‬ ‫تر‬ ‫ب‬ ‫ب‬ ‫ب‬ ‫شدا‬ ‫بأ‬ ‫ب‬ ‫ب‬ ‫رس‬ . ‫ب‬ ‫يي‬ ‫بر‬ ‫ب‬ ‫ب‬ ‫تريص‬ ‫تت‬ ‫ء‬ ‫رت‬ ‫بس‬ ‫ب‬ ‫س‬ ‫ب‬ (UV-visible spectroscopy) ‫بقي‬ ‫ب‬ ‫رةية‬ ‫ب‬ ‫ب‬ ‫ب‬ ‫بر‬ ‫ب‬ ‫ووي‬ ‫بي‬ ‫ب‬ ‫لرن‬ ‫تر‬ ‫بر‬ ‫ب‬ ‫ويل‬ ‫بي‬ ‫ب‬ ‫لرن‬ ‫تر‬ ‫بي‬ ‫ب‬ ‫ب‬ ‫د‬ ‫نف‬ ‫بي‬ ‫ب‬ ‫رق‬ ‫ع‬ ‫بل‬ ‫ب‬ ‫ح‬ ‫ب‬ ‫ب‬ ‫ة‬ ‫ب‬ ‫ب‬ ‫را‬ ‫بي‬ ‫ب‬ ‫ق‬ ‫ب‬ ‫ب‬ ‫شعل‬ ‫توم‬ ‫بر‬ ‫ب‬ ‫تس‬ ‫ب‬ ‫ب‬ ‫ر‬ ‫تر‬ ‫بم‬ ‫ب‬ ‫ترطق‬ ‫ب‬ ‫ب‬ ‫ض‬ % (85-95) ‫تر‬ ‫بر‬ ‫ب‬ ‫بي‬ ‫ب‬ ‫ري‬ ‫ب‬ ‫ب‬ ‫عل‬ ‫بر‬ ‫ب‬ ‫تعس‬ ‫ترغة‬ ‫تلرا‬ ، ‫لر‬ ‫تر‬ ‫تأليةقي‬ ‫ت‬ ‫و‬ ‫شعل‬ ‫تر‬ ‫ر‬ ‫حرريي‬ ‫ني‬ ‫سلك‬ ‫ت‬ ‫ي‬ ‫ق‬ ‫شعل‬ . ‫دي‬ ‫رلذف‬ ‫أ‬ ‫س‬ ‫ج‬ ‫ب‬ ‫ب‬ ‫ط‬ ‫حل‬ ‫ب‬ ‫ب‬ ‫ة‬ ‫توم‬ ‫بر‬ ‫ب‬ ‫وتس‬ ‫برا‬ ‫ب‬ ‫ترسل‬ ‫تر‬ ‫بر‬ ‫ب‬ ‫بي‬ ‫ب‬ ‫ري‬ ‫ا‬ ‫تف‬ ‫ر‬ ‫ب‬ ‫ت‬ ‫تا‬ ‫نا‬ ‫ب‬ ‫ووير‬ ‫ت‬ ‫تالةسص‬ ‫في‬ (3.93-4.1)eV . ‫شة‬ ‫يي‬ ‫تريصر‬ ‫ي‬ ‫ترط‬ ‫فجء‬ ‫يي‬ ‫تنر‬ ‫وم‬ ‫وتس‬ ‫رسلرا‬ ‫ب‬ ‫ت‬ ‫ةثلر‬ ‫ثر‬ ‫التس‬ ‫فإنا‬ (4.17) eV . AbstractThin solid films of SnO2 were deposited by chemical vapor deposition (CVD) method on glass substrate at 450C and 2.5L/min.air flow rate. Deposited films were annealed at different temperature (200,300,400,500) C in air for 60 minutes.Structural properties have been studied for annealed and unannealed films. It was found that the films have polycrystalline structure with grain diameter(190-230)A depend on annealing temperature. And the crystal structure is tetragonal with lattice constants (a=b=4.782 ,c=3.233)A.Optical properties also studied for annealed and unannealed films using UV-visible spectroscopy. The transmission spectra showed higher transparency over the visible wave length region with maximum value (85-95)% depend on annealing temperature. Absorption edge energy is increased by annealing temperature from (3.93 to 4.1)eV while Optical energy gap is not affected by annealing and it is found to be (4.17)eV. 93

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A method for the determination of the complex refractive index of non-metallic thin films using photometric measurements at normal incidence

Cited by 49 publications

References 13 publications

Disorder effects produced by the Mn and H incorporations on the optical absorption edge of Ga1−xMnxAs:H nanocrystalline films

Disorder effects produced by the Mn and H incorporations on the optical absorption edge of Ga1−xMnxAs:H nanocrystalline films

Thin films growth by PIIID technique from hexamethyldisilazane/argon mixture

Annealing Effect on Structural and Optical Properties of SnO2 Thin Films

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