A Micro Racetrack Optical Resonator Test Structure to Optimize Pattern Approximation in Direct Lithography Technologies

Higo, Akio; Sawamura, Tomoki; Fujiwara, M.; Ota, Etsuko; Mizushima, Ayako; Lebrasseur, Éric; Arakawa, Taro; Mita, Yoshio

doi:10.1109/icmts.2019.8730981

Cited by 3 publications

(1 citation statement)

References 6 publications

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“…At that, the involved roughness values are so small that they are impractical or even impossible to characterize using imaging techniques such as scanning electron or scanning probe microscopy, rendering this optimization task tedious. So far, studies about the suitability of different data preparation and exposure strategies based on the optical throughput of integrated waveguides are sparse and, obviously, highly dependent on the used lithography system, but clearly indicate the significance of this aspect to the optical scattering loss 7,8 . In this study, we focus on the optimization when using a pure variable shaped beam system without cell projection.…”

Section: Introductionmentioning

confidence: 99%

Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides

Greul,

Edelmann,

Fasold

et al. 2024

Novel Patterning Technologies 2024

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Integrated photonics offer a miniaturization potential for applications like sensing, data communication, as well as emerging quantum technologies. In this paper we show optical loss measurements for different e-beam approximation, data preparation, and exposure strategies concerning optical waveguides. The focus is on both, the decrease of e-beam writing time and the reduction of optical loss, which is achieved by applying Vistec's shot count optimized and edge roughness aware JES Approximation, as compared to the common Border Approximation.

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Section: Introductionmentioning

confidence: 99%

Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides

Greul,

Edelmann,

Fasold

et al. 2024

Novel Patterning Technologies 2024

View full text Add to dashboard Cite

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Micro-Optical Line Generator Metalens for a Visible Wavelength Based on Octagonal Nanopillars Made of Single-Crystalline Silicon

et al. 2022

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Conventionally, silicon is less often selected as the material of dielectric metasurfaces in the visible band than other lossless materials, including titanium dioxide, silicon nitride, and gallium nitride. The reason is its relatively high extinction coefficient and resulting low transmittance. This study demonstrated that accurately designed nanopillars made of single-crystal silicon could be used satisfactorily on a metasurface, even in the visible band. Four line-focusing metasurface lenses were designed to verify the lens performance effectiveness of silicon nanopillars in the visible band. In addition, a combination of the character projection and the variable-shaped beam modes in the electron beam lithography was operated to evaluate the compatibility between mass productivity and accuracy. We successfully obtained a highly efficient line-focusing metasurface lens composed of single crystalline silicon nanopillars. The parameters of the metasurface lens at a wavelength of 532 nm were as follows: lens thickness, 300 nm; focal length, 3.91 mm; square aperture, 2 mm; numerical aperture, 0.25; measured transmittance, 38.4% to 46.8%; and measured beam spot width, 3.68 µm (full width at half maximum, FWHM) at the focal point. The results obtained in this study show a promising use of silicon metasurface for optical sensor applications in the visible band.

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Edge Quality Control of an Optical Racetrack Resonator by Character Projection/Variable-shaped Beam Method to Optimize Pattern Approximation in F7000S-VD02

et al. 2022

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A Micro Racetrack Optical Resonator Test Structure to Optimize Pattern Approximation in Direct Lithography Technologies

Cited by 3 publications

References 6 publications

Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides

Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides

Micro-Optical Line Generator Metalens for a Visible Wavelength Based on Octagonal Nanopillars Made of Single-Crystalline Silicon

Edge Quality Control of an Optical Racetrack Resonator by Character Projection/Variable-shaped Beam Method to Optimize Pattern Approximation in F7000S-VD02

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