1999
DOI: 10.1016/s0040-6090(99)00461-7
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A microstructural study of transparent metal oxide gas barrier films

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Cited by 107 publications
(66 citation statements)
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“…It is observed that a 10 nm thick Al 2 O 3 film already shows very good barrier properties. The WVTR saturates for films thicker than 20 nm to the value of 5 ϫ 10 −3 g m −2 day −1 , which is good for a single layer barrier, especially in comparison to the 0.40 g m −2 day −1 for a magnetron sputtered 34 nm thick AlO x film 18 and to the 0.045 g m −2 day −1 reported for plasma-enhanced chemical vapor deposited ͑PE-CVD͒ SiN x films with a thickness of 130 nm. 19 Similarly, for the thermal ALD process using TMA and H 2 O, Park et al reported a WVTR of 0.062 g m −2 day −1 for a polyethersulfone film coated on both sides with 30 nm Al 2 O 3 film deposited 90°C.…”
Section: Plasma-assisted Atomic Layer Deposition Of Almentioning
confidence: 78%
“…It is observed that a 10 nm thick Al 2 O 3 film already shows very good barrier properties. The WVTR saturates for films thicker than 20 nm to the value of 5 ϫ 10 −3 g m −2 day −1 , which is good for a single layer barrier, especially in comparison to the 0.40 g m −2 day −1 for a magnetron sputtered 34 nm thick AlO x film 18 and to the 0.045 g m −2 day −1 reported for plasma-enhanced chemical vapor deposited ͑PE-CVD͒ SiN x films with a thickness of 130 nm. 19 Similarly, for the thermal ALD process using TMA and H 2 O, Park et al reported a WVTR of 0.062 g m −2 day −1 for a polyethersulfone film coated on both sides with 30 nm Al 2 O 3 film deposited 90°C.…”
Section: Plasma-assisted Atomic Layer Deposition Of Almentioning
confidence: 78%
“…4, and that the dominant transport mechanism was permeation through the polymer substrate, followed by flux through available defects in the coating. This is in contrast to the behavior of water molecules that are believed to interact and react with deposited metal and oxide coatings [63]. In spite of the reported defects, the oxygen permeation of the coated polymer is typically two orders of magnitude lower than that of the uncoated polymer, as indicated in Table 1.…”
Section: Thin Metal Oxide Coatings On Polymersmentioning
confidence: 84%
“…OLEDs pre-comerciales basados en polímeros orgánicos, hasta la fecha no se han desarrollado modelos que de una forma precisa reproduzcan los parámetros de temperatura, luminosidad y densidad de corriente durante la operación de los [23,28] , pero los films así formados tienden a tener una densidad elevada de agujeros "pin holes". El Esquema 2 resume los métodos de encapsulación más comúnmente empleados.…”
Section: I31 Mecanismos De Degradaciónunclassified
“…La deposición atómica de capas (Atomic Layer deposition) [26][27] ha sido usada con éxito pese a que se pensaba que su baja velocidad de deposición podría perjudicar su aplicabilidad. La deposición de finas capas dieléctricas mediante bombardeo de nanopartículas sobre una superficie (sputtering) también es prometedora [23,28] , pero los films así formados tienden a tener una densidad elevada de agujeros "pin holes". El Esquema 2 resume los métodos de encapsulación más comúnmente empleados.…”
Section: Disminución De La Vida úTil Del Oledunclassified
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