2009
DOI: 10.1016/j.mee.2008.10.023
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A model of self-limiting residual acid diffusion for pattern doubling

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Cited by 3 publications
(7 citation statements)
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“…This reaction system is well known in biology and chemistry, see . For an example occurring in the simulation of the postexposure‐bake step in optical lithography we refer to . The MMH‐mechanism is the reaction system X 1 + X 2 X 3 X 2 + X 4 . Here, an enzyme X 1 reacts with the substrate X 2 to form a complex X 3 which then decays to the product X 4 and releases the substrate X 2 .…”
Section: Numerical Examplementioning
confidence: 99%
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“…This reaction system is well known in biology and chemistry, see . For an example occurring in the simulation of the postexposure‐bake step in optical lithography we refer to . The MMH‐mechanism is the reaction system X 1 + X 2 X 3 X 2 + X 4 . Here, an enzyme X 1 reacts with the substrate X 2 to form a complex X 3 which then decays to the product X 4 and releases the substrate X 2 .…”
Section: Numerical Examplementioning
confidence: 99%
“…At thermodynamic equilibrium the chemical activities are constant over all control volumes K V , therefore the solution can be obtained by solving 0 = R 1 ( a * ) = a 1 * a 2 * a 3 * , 0 = R 4 ( a * ) = a 2 * a 4 * a 3 * together with . In the model that we have in mind , the diffusion coefficient of X 2 is given by D 2 ( a 1 , a 4 ) = D 20 exp true( φ 3 φ 1 true u ¯ 1 a 1 + ( 1 φ 1 ) true u ¯ 4 a 4 φ 2 true u ¯ 1 a 1 + ( 1 φ 2 ) true u ¯ 4 a 4 true) , where φ 1 , φ 2 , φ 3 are so‐called lumped constants, see . All other diffusion coefficients are assumed to be piecewise constant and independent of the concentration.…”
Section: Numerical Examplementioning
confidence: 99%
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