2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems 2012
DOI: 10.1109/esime.2012.6191778
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A multivariate parameter analysis of copper pillars eases the design of denser interconnects

Abstract: Electronic packaging increasingly aims at copper pillars as an interconnect concept, because of their benefits for fine pitches, high aspect ratios, high elec tromigration stability and excellent thermal conductivity. The thermal expansion and high stiffness of the pillars remains a design challenge when building-up more copper volume close to the silicon die. Specific pillar geometries and structured underfills have been suggested but included only few parameter variations. To gain profound insight into the t… Show more

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“…To the contrary, in electronic packaging a low CTE mismatch is desired, and although a low Young's modulus could accommodate the stress consequences of such, interconnects are protected by a moderate Young's modulus and a close-to-interconnect CTE. The most sen sitive z-position of the interconnect that needs protection has been subject of different studies [1], [2], and there are also partial-height underfills commercially available now [3]. Thus, any parameters to influence the Young's modulus and CTE of the underfill layer are of interest.…”
Section: Introduction: Sub-layering In Underfill Modellingmentioning
confidence: 98%
“…To the contrary, in electronic packaging a low CTE mismatch is desired, and although a low Young's modulus could accommodate the stress consequences of such, interconnects are protected by a moderate Young's modulus and a close-to-interconnect CTE. The most sen sitive z-position of the interconnect that needs protection has been subject of different studies [1], [2], and there are also partial-height underfills commercially available now [3]. Thus, any parameters to influence the Young's modulus and CTE of the underfill layer are of interest.…”
Section: Introduction: Sub-layering In Underfill Modellingmentioning
confidence: 98%