2009
DOI: 10.1007/s00542-009-0916-0
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A nano-metrology system with a two-dimensional combined optical and X-ray interferometer and an atomic force microscope

Abstract: A two-dimensional nano-scale measuring system utilizing a two-dimensional combined optical and X-ray interferometer (2D COXI) was developed for the standardization of measurement in the nanometer region. The system consists of a 2D COXI and an atomic force microscope (AFM). The designed, two-dimensional, flexure-stage scans and the cantilever tip probes the nanostructure of the specimen. The calibrated optical interferometers in the 2D COXI were used to measure two-dimensional nano-scale lengths. The accuracy … Show more

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Cited by 8 publications
(3 citation statements)
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References 16 publications
(21 reference statements)
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“…Yacoot et al [37] investigated the potential combination of an x-ray interferometer and optical interferometer as a 1D long-range, high-resolution scanning stage for an AFM in order to measure variations in the grating period. Park et al [258] developed a 2D combined optical and x-ray interferometer, which combines an x-ray interferometer, two optical interferometers and an AFM. Research and applications of these competitive integrated flexible measurement systems are constantly improved [259][260][261][262].…”
Section: Competitive Integrationmentioning
confidence: 99%
“…Yacoot et al [37] investigated the potential combination of an x-ray interferometer and optical interferometer as a 1D long-range, high-resolution scanning stage for an AFM in order to measure variations in the grating period. Park et al [258] developed a 2D combined optical and x-ray interferometer, which combines an x-ray interferometer, two optical interferometers and an AFM. Research and applications of these competitive integrated flexible measurement systems are constantly improved [259][260][261][262].…”
Section: Competitive Integrationmentioning
confidence: 99%
“…Besides, the DPMI is widely applied for the nano-metrology in the micro-field, e.g. the positioning of the photomask [9][10][11][12]. In the measurement for the circular path of the NC machine tool, the target plane mirror is not only driven in the longitudinal (measurement beam direction), but also in the lateral direction (Orthogonal with the measurement beam).…”
Section: Introductionmentioning
confidence: 99%
“…Laser interferometers are recognized as standard instruments for high-accuracy length measurement and are widely used in numerical control machining [1][2][3][4][5], aerospace [6][7][8], microelectronics and semiconductors [9][10][11], precision metrology [12][13][14], and so on. Interferometer-based measurement methods and applications have become a hot issue for researchers and scholars [15][16][17][18][19][20][21][22].…”
Section: Introductionmentioning
confidence: 99%