A new approach to molecular devices using SAMs, LSMCD and Cat-CVD

Abstract

This paper proposes a new technology for the fabrication of molecular devices using nanotechnology based on liquid and surface sciences recently developed, such as the direct patterning of solid surfaces using the difference of hydrophobic and hydrophilic properties of selfassembled mono-layers and self-assembly films of metal nanoparticles, the fine fabrication of films by the method of Liquid Source Misted Chemical Deposition, and the Langmuir-Blodgett self-assembly films. In these liquid-based technologies, various kinds of organic compounds in solutions, including biological systems, can be used as functional materials in molecular devices. In addition, it has been found that the insulating inorganic films obtained by catalytic chemical vapor deposition are quite effective in the protection of molecular devices against water and/or oxygen. We confirm, from the experimental results presented in this report, that this new approach is practically promising in future. q

Surface Processing for Area Selective Mist Deposition of Nanocrystalline Quantum Dot Films

“…It is believed that after the decomposition caused by UV, the FOTS monolayer terminates with -OH groups making surface hydrophilic [4,6] material and returning it the hydrophobic condition, should be possible through the adequately applied rapid thermal process. Figure 4 shows the results of the temperature and time of the Rapid Thermal Surface Treatment (ROST) on the contact angle of the FOTS surface after UV exposure.…”

Engineering nanostructures at surfaces using nanolithography

“…Silane-based SAMs posses higher stability upon irradiation compared with thiols chemisorbed on gold and only deep UV irradiation causes the siloxane to desorb. Therefore, a wider range of wavelengths are available for non-destructive processes aimed at the selective modification of photosensitive groups in the molecule backbone of siloxane SAMs [106,112,[120][121][122][123][124]. In this context, silane coupling agents containing photo-cleavable 2-nitrobenzil esters have been used to produce siloxane SAMs which can be selectively converted from ester-to carboxylic acid-terminated surfaces by exposure to UV light (Fig.…”

“…In this context, silane coupling agents containing photo-cleavable 2-nitrobenzil esters have been used to produce siloxane SAMs which can be selectively converted from ester-to carboxylic acid-terminated surfaces by exposure to UV light (Fig. 14) [123]. Moreover, Vossmeyer et al [120] have exploited the use of organosiloxanes SAMs containing photocleavable protecting groups for the simultaneous immobilization of different semiconducting and metallic nanoparticles on different areas of a surface.…”

Characterization of SAMs with Small and Bulky Terminal Functional Groups

“…Especially, many researchers have focused on developing molecular logic and memory devices which requires nanotechnology for device fabrication and implementation. In addition, the self-assembly technique has attracted researchers for the fabrication of molecular device [5]. SAMs can offer distinct advantages in uniformity of structure and potentially lowered fabrication costs.…”