1998 International Semiconductor Conference. CAS'98 Proceedings (Cat. No.98TH8351)
DOI: 10.1109/smicnd.1998.732307
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A new device for smart power integrated circuits - the trench lateral DMOSFET

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Cited by 5 publications
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“…Power MOSFETs with a trench-based technology have been shown to reduce R on,sp because of the reduced cell pitch [1,2]. Fujishima and Salama investigated a trench lateral power MOSFET (TLPM) with a trench bottom drain contact with the simulated performances of V B = 80V and R on,sp = 0.8 mX cm 2 [3].…”
Section: Introductionmentioning
confidence: 99%
“…Power MOSFETs with a trench-based technology have been shown to reduce R on,sp because of the reduced cell pitch [1,2]. Fujishima and Salama investigated a trench lateral power MOSFET (TLPM) with a trench bottom drain contact with the simulated performances of V B = 80V and R on,sp = 0.8 mX cm 2 [3].…”
Section: Introductionmentioning
confidence: 99%