Journal of Non-Crystalline Solids
 1991
DOI: 10.1016/s0022-3093(05)80208-x
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A new, laminar flow photo-CVD method for preparing hydrogenated amorphous silicon films

Akihiko Furukawa
1
,
Yoshihiro Iida
2
,
Tomohiro Yamaguchi
3
et al.
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Cited by 4 publications
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