1986
DOI: 10.1016/0020-0891(86)90063-1
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A new method for the determination of the thickness, the optical constants and the relaxation time of weakly absorbing semiconducting thin films

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Cited by 46 publications
(10 citation statements)
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“…The Metal-Insulator-Semiconductor (MIS) structure is currently receiving attention in solar cell research [1][2][3][4][5][6][7][8]. It has several advantages over p-n junctions; first, MIS structure considerably simpler to fabricate, thus is reducing the overall cell cost drastically.…”
Section: Intorductionmentioning
confidence: 99%
“…The Metal-Insulator-Semiconductor (MIS) structure is currently receiving attention in solar cell research [1][2][3][4][5][6][7][8]. It has several advantages over p-n junctions; first, MIS structure considerably simpler to fabricate, thus is reducing the overall cell cost drastically.…”
Section: Intorductionmentioning
confidence: 99%
“…At the arbitrary frequency, we have the following expression: . (11) It is the approach (11) that enables to ground the validity of interferogram apparatus characteristic determination [16,17] , where δ ∆ is the width contour extreme in phase units (phase distance between frequencies 2 , 1…”
Section: Slsfp With Resonant Dispersion (2)mentioning
confidence: 99%
“…Recently, the so-called method of envelope functions as tangential to contours of amplitude spectra of light reflection and transmission by a single-layer Fabry-Perot structures [10][11][12][13][14][15][16][17][18][19] was developed. So, for example, on the basis of the method the approach for determining the variation parameters in thickness and influence of spectral distribution of light and light absorption [9][10][11][12][13][14][15] was grounded. The envelope function method was used for grounding the new approach for determination of the instrumental characteristics of interference bands [16,17] and for reconstruction of the phase of a reflected wave by single-layer films [16,17,19].…”
Section: Introductionmentioning
confidence: 99%
“…Son zamanlarda, zarf eğrisi yönteminin doğruluğu ve kolaylığını geliştirmek için bazı yaklaşımlar sunulmuştur [14][15][16][17]. Bu çalışmalar, filmlerin optik sabitlerini ve kalınlığını belirlemek için zarf eğrisi yönteminin yansıma ve geçirgenlik spektrumlarına [15,16] veya yalnızca yansıma spektrumlarına [14,17] uygulanması üzerine odaklanmış kıymetli bilgiler sağlamaktadır. Bu çalışmalar arasında, zarf eğrisi yaklaşımının yansıma spektrumlarına genişletilmesine dayanan yeni bir yöntem Kushev ve ark.…”
Section: Introductionunclassified
“…Bu çalışmalar arasında, zarf eğrisi yaklaşımının yansıma spektrumlarına genişletilmesine dayanan yeni bir yöntem Kushev ve ark. [14] tarafından saptanmıştır. Bir yansıma maksimumu bir geçirgenlik minimumuna (veya tam tersi de olabilir) karşılık geldiğinden, kompleks dielektrik sabiti ve kompleks kırılma indisi aynı zamanda yansıma ekstremumundan da belirlenebilir.…”
Section: Introductionunclassified