A new RuO4 solvent solution for pure ruthenium film depositions

(Invited) High-k Dielectrics and High Work Function Metals for Hybrid Floating Gate NAND Flash Applications

“…Good stoichiometry, thickness control and stability when exposed to air are found for the whole range of compositions. Ru is grown onto TiN(3 nm) by atomic layer deposition (ALD) using ToRuS as a precursor (5). TiN prevents the formation of Ru silicide, that is observed at temperatures as low as 600 °C.…”

High-resolution infrared spectroscopy and analysis of the ν2/ν4 bending dyad of ruthenium tetroxide

“…A preliminary simulation for 102 RuO 4 only was performed, using the XTDS software [25], which implements the formalism described in the previous section, starting from first guess Hamiltonian parameters, adapted from ref 7 and 24, and estimating first the Coriolis constants from the well-known sum rule and relations [28]. In particular, from ref 7, the Coriolis constant 3 could be determined as 0.1943, thus, since 3 + 4 ≈ 0.5, 4 =0.3057 was taken as a starting value and thus a parameter value was assumed. In the following, the ground state effective Hamiltonian was expanded up to order zero only, since we have no precise spectroscopic ground state data.…”

“…It is also a powerful oxidant and can be used in oxidation reactions [1,2]. RuO 4 is quite reactive at room temperature and decomposes readily to produce RuO 2 films, which is used in the semiconductor industry [3]. Ru is also a fission product of uranium and can be created, under its volatile form RuO 4 , after an air inlet in the nuclear containment and can be used as a marker of air ingress in the reactor during a severe nuclear accident [4][5][6].…”

“…Up to now, only the strongly IR-active, ν 3 stretching fundamental has been investigated at highresolution (0.001 cm -1 ) and rotationally analyzed as an isolated band [7,17], with help of a 102 Rusample. Analysis of the rotational structure was made possible by the fact that oxygen atoms have no nuclear spin, implying that only A 1 and A 2 rovibrational levels are allowed, which makes the RuO 4 4 in the far infrared is a specially challenging task and several difficulties must be overcome: the molecule is reactive and a special procedure must be used for the synthesis and handling of an isotopically enriched sample.…”

Infrared spectroscopy of ruthenium tetroxide and high-resolution analysis of the ν3 band

“…This molecule has several practical uses. First, it is a powerful oxidant and can be used in oxidation reactions of a number of organic molecules [1,2] or to produce RuO 2 films for the semiconductor industry [3]. Ru is also a fission product of uranium and can be created, under its volatile form RuO 4 , after an air inlet in the nuclear containment.…”