2011
DOI: 10.1117/12.888969
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A new XUV-source for seeding a FEL at high repetition rates

Abstract: Improved performance of Free Electron Laser (FEL) light sources in terms of timing stability, pulse shape and spectral properties of the amplified FEL pulses is of interest in many fields of science. A promising scheme is direct seeding with High-Harmonic Generation (HHG) in a noble gas target. A Free-Electron-Laser seeded by an external XUV-source is planned for FLASH II at DESY in Hamburg. The requirements for the XUV/soft X-ray source can be summarized as follows: A repetition rate of at least 100 kHz in a … Show more

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Cited by 2 publications
(2 citation statements)
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“…117 Compared to typical HHG efficiencies of 10 7 -10 8 achieved with 800 nm driving lasers, 44 this is an improvement of two to three orders of magnitude. Important applications in the <100 eV range that require very high photon flux are XUV lithography, [118][119][120] seeding of x-ray freeelectron lasers, [121][122][123] and attosecond spectroscopy. 43,[124][125][126] For these applications the efficient generation of XUV high harmonics driven by ultrashort 400 nm pulses, with slightly higher electric fields than that of 800 nm pulses, could have a significant impact.…”
Section: Xuv Generationmentioning
confidence: 99%
“…117 Compared to typical HHG efficiencies of 10 7 -10 8 achieved with 800 nm driving lasers, 44 this is an improvement of two to three orders of magnitude. Important applications in the <100 eV range that require very high photon flux are XUV lithography, [118][119][120] seeding of x-ray freeelectron lasers, [121][122][123] and attosecond spectroscopy. 43,[124][125][126] For these applications the efficient generation of XUV high harmonics driven by ultrashort 400 nm pulses, with slightly higher electric fields than that of 800 nm pulses, could have a significant impact.…”
Section: Xuv Generationmentioning
confidence: 99%
“…117 Compared to typical HHG efficiencies of 10 7 -10 8 achieved with 800 nm driving lasers, 44 this is an improvement of two to three orders of magnitude. Important applications in the <100 eV range that require very high photon flux are XUV lithography, [118][119][120] seeding of x-ray freeelectron lasers, [121][122][123] and attosecond spectroscopy. 43,[124][125][126] For these applications the efficient generation of XUV high harmonics driven by ultrashort 400 nm pulses, with slightly higher electric fields than that of 800 nm pulses, could have a significant impact.…”
Section: Xuv Generationmentioning
confidence: 99%