In this paper, an a-Si:H/a-SiC:H separated absorption and multiplication region superlattice avalanche photodiode (SAM-SAPD) using combined effect of band edge discontinuity and build-in potential in p-n junction is designed and fabricated successfully. The formula that describe the relationships among excess noise factor (F e), mean multiplication (e M), and the ionization rate ratio (k s) for this SAM-SAPD are established theoretically. The comparisons between the theoretical calculations and the experimental results for F e vs. M e are discussed.