The
arrival of the 5G era requires that the solder resist coating
of electronic chips involved in high-frequency communication technology
has more promising comprehensive properties, including strong mechanical
properties, high heat resistance, and voltage breakdown resistance.
Herein, an efficient method was proposed to modify bisphenol A diglycidyl
ether (DGEBA) with various diamine chain extenders, and five representative
chain-extended DGEBA epoxy resins were constructed by introducing
aliphatic and aromatic segments. On this basis, the epoxy-terminated
resins were reacted with acrylic acid (AA) and then with tetrahydrophthalic
anhydride (THPA) to produce photocurable resin with alkaline development.
Owing to the high reactivity of amino groups, chain extension with
diamines possesses the characteristics of a fast reaction under relatively
mild conditions. The characteristic molecular structures (various
numbers of rigid benzene rings or flexible aliphatic chains bonded
with different numbers of ethers) of diamine profoundly affect the
mechanical/thermal properties of the prepared UV-cured resins. The
chain extension strategy is the key to striking a balance between
high heat resistance and robust mechanical properties for traditional
epoxy resins. The optimal UV-cured TPER-modified (P-BA) film manifests
superior elongation at break (8.6%), robust toughness (4.1 MJ cm–3), and high heat resistance (T
g = 141.8 °C). Furthermore, the practical application
of the modified resin as the customized pattern of the solder resist
coating was demonstrated, which is expected to provide important guiding
significance for improving the multifunctional bisphenol A UV-curable
epoxy resin.