A novel electron-beam-based photomask repair tool

Edinger, Klaus; Becht, Hans; Becker, Rainer; Bert, Volker; Boegli, Volker; Budach, Michael; G÷hde, Susanne; Guyot, J. L.; Hofmann, Thorsten; Hoinkis, Ottmar; Kaya, Alexander; Koops, Hans W. P.; Spies, Petra; Weyrauch, Bernd; Bihr, Johannes

doi:10.1117/12.532866

Cited by 18 publications

(16 citation statements)

References 6 publications

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“…An effect similar to that in e-beam lithography, here called the "BSE proximity effect," was reported by, for instance, Lau et al, 8 Boero et al, 31 and Edinger et al 26 Extra deposition can be observed as a halo around the base of tips ͓Fig. 33͑a͔͒ or around lines ͓Fig.…”

Section: Deposit Locationmentioning

confidence: 63%

“…Examples are probes ͑functionalized tips for scanning probe microscopy or for local conductivity measurements͒, [6][7][8][9][10][11][12][13][14] conducting or nonconducting joining technique, [15][16][17][18][19][20] conducting wires, [21][22][23][24] mask repair, [25][26][27] electron sources, [28][29][30] micro-Hall and micro superconducting quantum interference devices, 31,32 nanotweezers and gripping devices, 33,34 nano-optic patterns or photonic crystals, 35,36 entire miniature electron optical systems, 37 diodes, 38 and seeds for nanotube growth. 39 Despite its long history, detailed knowledge of the process is still very much dispersed.…”

Section: Introductionmentioning

confidence: 99%

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A critical literature review of focused electron beam induced deposition

Dorp

Hagen

2008

Journal of Applied Physics

486

577

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An extensive review is given of the results from literature on electron beam induced deposition. Electron beam induced deposition is a complex process, where many and often mutually dependent factors are involved. The process has been studied by many over many years in many different experimental setups, so it is not surprising that there is a great variety of experimental results. To come to a better understanding of the process, it is important to see to which extent the experimental results are consistent with each other and with the existing model. All results from literature were categorized by sorting the data according to the specific parameter that was varied ͑current density, acceleration voltage, scan patterns, etc.͒. Each of these parameters can have an effect on the final deposit properties, such as the physical dimensions, the composition, the morphology, or the conductivity. For each parameter-property combination, the available data are discussed and ͑as far as possible͒ interpreted. By combining models for electron scattering in a solid, two different growth regimes, and electron beam induced heating, the majority of the experimental results were explained qualitatively. This indicates that the physical processes are well understood, although quantitatively speaking the models can still be improved. The review makes clear that several major issues remain. One issue encountered when interpreting results from literature is the lack of data. Often, important parameters ͑such as the local precursor pressure͒ are not reported, which can complicate interpretation of the results. Another issue is the fact that the cross section for electron induced dissociation is unknown. In a number of cases, a correlation between the vertical growth rate and the secondary electron yield was found, which suggests that the secondary electrons dominate the dissociation rather than the primary electrons. Conclusive evidence for this hypothesis has not been found. Finally, there is a limited understanding of the mechanism of electron induced precursor dissociation. In many cases, the deposit composition is not directly dependent on the stoichiometric composition of the precursor and the electron induced decomposition paths can be very different from those expected from calculations or thermal decomposition. The dissociation mechanism is one of the key factors determining the purity of the deposits and a better understanding of this process will help develop electron beam induced deposition into a viable nanofabrication technique.

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Section: Deposit Locationmentioning

confidence: 63%

Section: Introductionmentioning

confidence: 99%

A critical literature review of focused electron beam induced deposition

Dorp

Hagen

2008

Journal of Applied Physics

486

577

View full text Add to dashboard Cite

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“…7 One of the challenges in EBID are the so-called proximity effects, i.e., the scattering and the secondary emission of electrons, which lead to an effective broadening of the deposits compared to the diameter of the primary beam. 4 The BSE proximity effect [7][8][9][10] is caused by BSEs and the thereby induced SEs, while the forward scattered electron (FSE) proximity effect [11][12][13] originates from scattering within an already produced deposit; both effects can cause deposition of material away from the PE impact area. In EBID, there is always a superposition of FSE and BSE proximity effects, i.e., these proximity effects cannot be studied separately.…”

mentioning

confidence: 99%

Investigation of proximity effects in electron microscopy and lithography

Walz

Vollnhals

Rietzler

et al. 2012

Applied Physics Letters

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A novel apparatus for in situ compression of submicron structures and particles in a high resolution SEM Rev. Sci. Instrum. 83, 095105 (2012) Foucault imaging by using non-dedicated transmission electron microscope Appl. Phys. Lett. 101, 093101 (2012) New Products Rev. Sci. Instrum. 83, 079501 (2012) Towards secondary ion mass spectrometry on the helium ion microscope: An experimental and simulation based feasibility study with He+ and Ne+ bombardment

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“…FEB gas assisted etching is mainly pushed for photomask repair at the 65 nm node and below 39 . The main reasons are the resolution and low damage achievable with electrons as well as that no implantation of ions takes places.…”

Section: Focused Electron Beam Induced Etchingmentioning

confidence: 99%

Comparison of fabrication methods of sub-100nm nano-optical structures and devices

et al. 2005

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Nano-optical devices are raising more and more interest for a variety of applications. From single molecule detection at high molecular concentration by Fluorescence Correlation Spectroscopy (FCS) through optical multiplexing with photonic crystal structures into the exciting field of negative index of refraction materials, the hardware functional dimensions and surely the tolerances are reaching the lower tens of nanometer range. The fabrication of such devices, i.e. the machining of optically interesting materials and material combinations (dielectric, semiconducting, or metallic) at this scale needs adaptation of classical nanostructuring technologies like Electron Beam Lithography (EBL), or the application of serial direct machining technologies like Focused Charged Particle Beam Etching or Deposition with electrons or Ga ions. For low excitation volume FCS measurements, EBL is used for production of high quality nanoscale sub-wavelength apertures in optically opaque (150 nm thick) metal films. The process consists in high aspect ratio patterning of a thick negative e-beam resist film followed by metal lift off. The optically transparent substrate allows the production of any 2D aperture geometry. Difficulties of the production process and their limits are presented. Direct serial machining with charged particle beams shows excellent flexibility and is an interesting 3D alternative method. Deposition by decomposing volatile chemicals under an ion/electron probe, which can be as small as 7nm/1nm, this technique allows for rapid, local prototyping of 2D and 3D nano-structures with highest lateral and axial resolution. The deposited material can be tuned to homogeneous, nanocomposite or crystalline, metallic or transparent, opening the way to applications in photonic crystals and plasmonics. An original in-situ micro-reflectometry method permits the real time control of the growth of the deposits.

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A novel electron-beam-based photomask repair tool

Cited by 18 publications

References 6 publications

A critical literature review of focused electron beam induced deposition

A critical literature review of focused electron beam induced deposition

Investigation of proximity effects in electron microscopy and lithography

Comparison of fabrication methods of sub-100nm nano-optical structures and devices

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