A novel fabrication process of 3-D microstructures by double exposure in standard deep X-ray lithography

Matsuzuka, Naoki; Hirai, Yukihiko; Tabata, Osamu

doi:10.1109/mems.2004.1290676

Cited by 11 publications

(10 citation statements)

References 9 publications

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“…A method to overcome the limitation in feature height is the use of X-ray lithography and pursue inclined exposure leading to needle-type shapes as it has been shown, for example, by Turner et al [20] using SU-8 and Matsuzuka et al [21], who were using polymethyl methacrylate. Again, hollow structures suitable for microfluidic conduits within a sharp tip were not yet demonstrated by these authors.…”

Section: High Aspect-ratio Polymer Fabricationmentioning

confidence: 99%

Integrated Lithographic Molding for Microneedle-Based Devices

Lüttge

Berenschot

Boer

et al. 2007

J. Microelectromech. Syst.

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Abstract-This paper presents a new fabrication method consisting of lithographically defining multiple layers of high aspect-ratio photoresist onto preprocessed silicon substrates and release of the polymer by the lost mold or sacrificial layer technique, coined by us as lithographic molding. The process methodology was demonstrated fabricating out-of-plane polymeric hollow microneedles. First, the fabrication of needle tips was demonstrated for polymeric microneedles with an outer diameter of 250 µm, through-hole capillaries of 75-µm diameter and a needle shaft length of 430 µm by lithographic processing of SU-8 onto simple v-grooves. Second, the technique was extended to gain more freedom in tip shape design, needle shaft length and use of filling materials. A novel combination of silicon dry and wet etching is introduced that allows highly accurate and repetitive lithographic molding of a complex shape. Both techniques consent to the lithographic integration of microfluidic back plates forming a patchtype device. These microneedle-integrated patches offer a feasible solution for medical applications that demand an easy to use Point-of-Care sample collector, for example, in blood diagnostics for lithium therapy. Although microchip capillary electrophoresis glass devices were addressed earlier, here, we show for the first time the complete diagnostic method based on microneedles made from SU-8.[ 2006-0110]Index Terms-Blood, deep reactive-ion etching (DRIE), diagnostics, lithographic molding, microneedle, multilayer lithography, Point-of-Care, preprocessed substrate, SU-8.

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Section: High Aspect-ratio Polymer Fabricationmentioning

confidence: 99%

Integrated Lithographic Molding for Microneedle-Based Devices

Lüttge

Berenschot

Boer

et al. 2007

J. Microelectromech. Syst.

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“…A variety of three-dimensional (3-D) processing technologies, such as KOH anisotropic etching of silicon and laser machining [1], have been employed for the fabrication of microelectromechanical systems (MEMS). Previously, some research on 3-D processing methods using X-ray lithography with synchrotron radiation (SR) has been reported [2][3][4][5]. All these methods depend on the distribution of the exposure energy on the resist surface.…”

Section: Introductionmentioning

confidence: 99%

“…In order to examine the factor by which too much etching has been generated, we have investigated the relation between energy and the etching mechanism. In the process, side etching was considered as a factor that causes a form error [4]. Figure 3 shows side etching.…”

Section: Introductionmentioning

confidence: 99%

Shape Prediction of 3‐D Microstructures Fabricated by PCT Technique and Synchrotron Radiation Lithography

Horade

Saito

2010

IEEJ Transactions Elec Engng

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We report in this paper simulations for deformed shape predictions of three-dimensional (3-D) microstructures fabricated by the plane pattern to cross-section transfer (PCT) technique and synchrotron radiation (SR) lithography. The investigation of the shape-prediction system enhances the possibility for higher accuracy of the prediction. In addition, the desired shapes can be confirmed by the shape prediction before designing the mask and running experiments. It is necessary to investigate a variety of error factors to shape prediction. We attempted various investigations. One of the possible causes could be the etching direction, which is dependent on the developing time. Therefore, we currently emphasize on the factor causing this error. In order to comprehend the mechanism of the factor, an algorithm that can simulate development was devised. We have developed a mathematical system of X-ray energy distribution onto the PMMA (polymethylmethacrylate) resist, and the shape prediction is consequent to the simulations based on calculations from the mathematics software. The mathematical system for energy distribution depends on the SR light source, X-ray mask specification, and resist specification. As a result, the predicted structures relevant to the absorbed energy-depth-position parameter set and absorbed energy-etching rate parameter set were obtained from this system. This system for shape prediction was implemented by the above parameter sets in C language.

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“…Three-dimensional microfabrication technology using Synchrotron Radiation (SR) lithography is possible to be nanoscale and high aspect ratio fabrication which harnessed the characteristic of SR, and fabricate structures which has free-form and sidewall inclination surface. Before now, some research of three-dimension processing methods using SR light is already reported [2] [3] [4] [5] [6]. Each of these is techniques of giving exposure energy distribution to a resist surface.…”

Section: Introductionmentioning

confidence: 99%

Study on optimization of exposure energy distribution for fabrication of arbitrary 3-D microstructure by shaped beam using synchrotron radiation

Horade

Saito

2009

2009 International Symposium on Micro-NanoMechatronics and Human Science

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Resear ch on establishment of a fabr ication method of thr ee-dimensional micr ostr uctur e which used SR (Synchr otr on Radiation) light is r epor ted. As the advantage of this method, since ther e is no necessity of fabr ication masks and it is suitable for rapid pr ototyping, r eduction of fabr ication time and cost is mentioned. In this time, we car r y out basic research about r ealization of this fabr ication method, and it succeeded in fabrication of the free-for m surface by exposur e between pixels over lap. Mor eover , in or der to fabricate the thr ee-dimensional str uctur e of ar bitr ar y shape, the algor ithm which can deter mine exposure ener gy amount in consider ation of over lap was written to target for m. Using this algor ithm, fabrication of var ious ar bitr ar y thr ee-dimensional str uctur es was possible by only single aper tur e without manufactur e a mask for ever y for m. It is examining using this technique for fabr ication of -TAS or a reactor . The channel which has the inclination and fr ee-for m sur face are fabr icated by this method, impr ovement in functionality is pr omising.

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A novel fabrication process of 3-D microstructures by double exposure in standard deep X-ray lithography

Cited by 11 publications

References 9 publications

Integrated Lithographic Molding for Microneedle-Based Devices

Integrated Lithographic Molding for Microneedle-Based Devices

Shape Prediction of 3‐D Microstructures Fabricated by PCT Technique and Synchrotron Radiation Lithography

Study on optimization of exposure energy distribution for fabrication of arbitrary 3-D microstructure by shaped beam using synchrotron radiation

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