“…low-current/low-power processing, high resistance ratio, high speed, extended endurance/ retention, CMOS compatibility, analog reconfigurability, and design scalability [3,[13][14][15][16]). For instance, different materials are frequently used for resistive switching layers in memory devices, such as TiO 2 , HfO 2 , Ta 2 O 5 , WO 3 [17][18][19][20][21][22][23][24][25][26] for metal oxides ReRAM devices; GaSbGe, GST, GeTe/SbTe, graphene [27][28][29][30][31][32][33] for phase change memory devices; and SiO 2 , Zr, ZnO:Cr doped HfO 2 , and perovskites [34][35][36][37][38][39] for ferroelectric memories. Although the resistive switching mechanism may vary from one device to another and from technology to another (e.g.…”