2011
DOI: 10.1016/j.phpro.2011.03.121
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A novel Model for the Mechanism of Laser-Induced Back Side Wet Etching in Aqueous Cu Solutions using ns Pulses at 1064 nm

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Cited by 13 publications
(5 citation statements)
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“…In addition the average ablation rate for the silanized surface are lower for low iteration numbers because the number of adsorption sites for Cu 2+ is reduced due to the silanization. As discussed in the introductory chapter and in [7], this behavior is consistent with a partial blocking of the Cu 2+ absorption sites by the CH 3 -groups on the silanized surface. Once all silanized sites with the CH 3 -groups are removed the average ablation rate values for the silanized surface reach the values as measured from the untreated surface.…”
Section: Ablation Behaviorsupporting
confidence: 67%
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“…In addition the average ablation rate for the silanized surface are lower for low iteration numbers because the number of adsorption sites for Cu 2+ is reduced due to the silanization. As discussed in the introductory chapter and in [7], this behavior is consistent with a partial blocking of the Cu 2+ absorption sites by the CH 3 -groups on the silanized surface. Once all silanized sites with the CH 3 -groups are removed the average ablation rate values for the silanized surface reach the values as measured from the untreated surface.…”
Section: Ablation Behaviorsupporting
confidence: 67%
“…Our experiments (see [7] and this work) show that if the adsorption sites (or large parts of the adsorption sites) are blocked by CH 3 -groups due to the silanization treatment (see Figure 2b), the ablation onset is delayed. This corroborates the ablation model described above.…”
Section: Introductionmentioning
confidence: 60%
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“…LCLD is a wellknown technique and is applied for a long time already [1][2][3][4][5][6][7][8][9]. In recent work, our group investigated an ablation technique called laser induced backside wet etching (LIBWE) [10,11]. This technique allows smooth and controlled ablation of transparent materials using related setup components like LCLD and also related CuSO 4based solutions as absorber liquids.…”
Section: Introductionmentioning
confidence: 99%