1996
DOI: 10.1063/1.117700
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A novel multilayer circuit process using YBa2Cu3Ox/SrTiO3 thin films patterned by wet etching and ion milling

Abstract: A process combining hydrofluoric acid (HF) and Ar+ ion milling has been used to make YBa2Cu3Ox/SrTiO3/YBa2Cu3Ox(YBCO/STO/YBCO) multilayer test circuits. Low-angle steps can be readily etched in STO and YBCO films with this process. YBCO lines crossing 5° steps have about the same critical temperature Tc (89–90 K) and critical current density Jc (≳1×106 A/cm2 at 86 K) as lines on planar surfaces. Via connections have the same Tc as other circuit components and adequate critical currents for most circuit designs. Show more

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Cited by 10 publications
(3 citation statements)
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“…6,7 Our experiments allowed us to investigate the propagation of grain boundaries in a multilayer structure. This is an important material science issue itself because many practical devices require multilayer circuits consisting of crossovers, via connections, 8,9 and stacked superconducting paths over bicrystal grain boundaries. Bicrystal Josephson junctions are promising in device applications such as superconducting quantum interference devices ͑SQUIDs͒ 10 and voltage standards.…”
Section: ͓S0003-6951͑97͒00534-2͔mentioning
confidence: 99%
“…6,7 Our experiments allowed us to investigate the propagation of grain boundaries in a multilayer structure. This is an important material science issue itself because many practical devices require multilayer circuits consisting of crossovers, via connections, 8,9 and stacked superconducting paths over bicrystal grain boundaries. Bicrystal Josephson junctions are promising in device applications such as superconducting quantum interference devices ͑SQUIDs͒ 10 and voltage standards.…”
Section: ͓S0003-6951͑97͒00534-2͔mentioning
confidence: 99%
“…The processing of YBCO thin films as Josephson junctions and SQUIDs, constructed vertically on a substrate, has been reserving an important place in the multilayer fabrication [1][2][3][4][5][6]. There is a demand for multilayer fabrication for the purpose of reducing the noise problems and improving the sensitivity of these devices [7][8][9].…”
Section: Introductionmentioning
confidence: 99%
“…As approach to the problem, several groups used a modified ion beam etching process @E) [2]- [3]. Other approaches are a microshadow mask technique to form a film with smooth and gentle slope on edges in-situ [4], a process combining wet etching process using hydrofluoric acid and Ar ion milling [5], and complementary mask planarization [6]. We have introduced Chemical Mechanical Planarization (CMP) into the multilayer Manuscript recieved September 14, 1998 fabrication process in order to improve the superconducting and insulation properties.…”
Section: Introductionmentioning
confidence: 99%