A parameterization of the chemistry-normality dependence of bulk etch rate in a CR-39 detector

Strong etching formulation (time and rate) for PADC with deep depth bulk etch rate study

“…Inspecting Fig. 6 and Table 4 Bulk etch rates can also be predicted using an equation with only two adjusting parameters [5]. This simple equation can reproduce the bulk etch rate with accuracy where the best fitting parameters are: α=0.05, DF=10, and χ 2 < 18.307 as given in Table 5 and illustrated in Fig.…”

“…The standard procedure when using solid-state nuclear track detectors (SSNTD) is to reveal latent ion tracks by operating a chemical etching which makes them visible under the optical or atomic force microscope. Commonly used etching solutions in the literature are alkaline etchant such as NaOH or KOH with concentration range of 6-7 N at temperatures of 60-70 °C [1][2][3][4][5][6][7][8][9][10]. However, a new etchant solution composed of NaOH with different amounts of alcohols (ethanol and/or methanol) has been used as a strong and active etchant [11][12][13].…”

“…Recently, another equation assigned in terms of the etchant concentration (C), and free adjusting (a) and (b). This equation (referred here as Al-Jubbori-2016) was proposed in [5] as follows:…”