A poly(dimethylsiloxane)-coated flexible mold for nanoimprint lithography

Lee, Nae Yoon; Kim, Youn Sang

doi:10.1088/0957-4484/18/41/415303

Cited by 17 publications

(13 citation statements)

References 41 publications

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“…A direct comparison to Lee and Kim's 19 work on an isostatic pneumatic press can be Si etch rate decreases from 1.60 ± 0.34 lm/min to even 70.5 ± 1.8 nm/min due to an increase in total flow, pressure and O 2 concentration. On the other hand, AZ1518 photoresist etching mask is more sensitive to O 2 presence, varying from 38.9 ± 4.9 to 202 ± 5 nm/min.…”

Section: Az1518 Versus Su-8mentioning

confidence: 71%

Molds and Resists Studies for Nanoimprint Lithography of Electrodes in Low-Voltage Polymer Thin-Film Transistors

Cavallari

Zanchin

Pojar

et al. 2014

Journal of Elec Materi

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A low-cost patterning of electrodes was investigated looking forward to replacing conventional photolithography for the processing of low-operating voltage polymeric thin-film transistors. Hard silicon, etched by sulfur hexafluoride and oxygen gas mixture, and flexible polydimethylsiloxane imprinting molds were studied through atomic force microscopy (AFM) and field emission gun scanning electron microscopy. The higher the concentration of oxygen in reactive ion etching, the lower the etch rate, sidewall angle, and surface roughness. A concentration around 30 % at 100 mTorr, 65 W and 70 sccm was demonstrated as adequate for submicrometric channels, presenting a reduced etch rate of 176 nm/min. Imprinting with positive photoresist AZ1518 was compared to negative SU-8 2002 by optical microscopy and AFM. Conformal results were obtained only with the last resist by hot embossing at 120°C and 1 kgf/cm 2 for 2 min, followed by a 10 min post-baking at 100°C. The patterning procedure was applied to define gold source and drain electrodes on oxide-covered substrates to produce bottom-gate bottom-contact transistors. Poly(3-hexylthiophene) (P3HT) devices were processed on high-j titanium oxynitride (TiO x N y ) deposited by radiofrequency magnetron sputtering over indium tin oxide-covered glass to achieve low-voltage operation. Hole mobility on micrometric imprinted channels may approach amorphous silicon ($0.01 cm 2 /V s) and, since these devices operated at less than 5 V, they are not only suitable for electronic applications but also as sensors in aqueous media.

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Section: Az1518 Versus Su-8mentioning

confidence: 71%

Molds and Resists Studies for Nanoimprint Lithography of Electrodes in Low-Voltage Polymer Thin-Film Transistors

Cavallari

Zanchin

Pojar

et al. 2014

Journal of Elec Materi

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“…2(a) shows the replication step for the nanotrenches from a Si master mold to the polymer layer that was described elsewhere. [16][17][18] The Si master mold that was patterned into nanotrenches was fabricated through electron beam lithography. 19 The master mold was treated with O 2 plasma (25 W, 30 s) and immersed in a 0.5 wt% aqueous solution of 3-(aminopropyl trimethoxysilane) (APTMS) (Aldrich) for 10 min in order to graft aminosilane onto the surface of the mold.…”

Section: Nanochannel Constructionmentioning

confidence: 99%

Simple fabrication of hydrophilic nanochannels using the chemical bonding between activated ultrathin PDMS layer and cover glass by oxygen plasma

et al. 2011

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This study describes a simple and low cost method for fabricating enclosed transparent hydrophilic nanochannels by coating low-viscosity PDMS (monoglycidyl ether-terminated polydimethylsiloxane) as an adhesion layer onto the surface of the nanotrenches that are molded with a urethane-based UV-curable polymer, Norland Optical Adhesive (NOA 63). In detail, the nanotrenches made of NOA 63 were replicated from a Si master mold and coated with 6 nm thick layer of PDMS. These nanotrenches underwent an oxygen plasma treatment and finally were bound to a cover glass by chemical bonding between silanol and hydroxyl groups. Hydrophobic recovery that is observed in the bulk PDMS was not observed in the thin film of PDMS on the mold and the PDMS-coated nanochannel maintained its surface hydrophilicity for at least one month. The potentials of the nanochannels for bioapplications were demonstrated by stretching λ-DNA (48,502 bp) in the channels. Therefore, this fabrication approach provides a practical solution for the simple fabrication of the nanochannels for bioapplications.

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“…Alternatively, the fibers array can be first replicated in elastomers (Figure 1b). Poly(dimethylsiloxane) (PDMS) or PFPE‐urethane dimethacrylate is cast on fibers preliminarily treated by hexamethyldisilizane (HMDS) vapor,17 polymerized in situ (Figure 1f) and patterned by parallel nanochannels (Figure 1g). Another option is using oxygen plasma to gently remove the fiber material (not treated by HMDS) trapped in the elastomer without damaging the replicated pattern.…”

Section: Introductionmentioning

confidence: 99%

Soft Nanolithography by Polymer Fibers

Tu¹,

Pagliara²,

Camposeo³

et al. 2011

Adv Funct Materials

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We report on the use of polymer fi bers for large-area soft nanolithography on organic and inorganic surfaces with 50 nm resolution. The morphology of fi bers and of the corresponding patterned gap is investigated, demonstrating a lateral dimension downscaling of up to nine times, which greatly increases the achieved resolution during pattern transfer. In this way, we realize poly mer fi eld effect transistors with channel length and width as low as 250 nm that are expected to show transistor transition frequency up to a few MHz, and are thus exploitable as low-cost radio-frequency identifi cation devices.

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A poly(dimethylsiloxane)-coated flexible mold for nanoimprint lithography

Cited by 17 publications

References 41 publications

Molds and Resists Studies for Nanoimprint Lithography of Electrodes in Low-Voltage Polymer Thin-Film Transistors

Molds and Resists Studies for Nanoimprint Lithography of Electrodes in Low-Voltage Polymer Thin-Film Transistors

Simple fabrication of hydrophilic nanochannels using the chemical bonding between activated ultrathin PDMS layer and cover glass by oxygen plasma

Soft Nanolithography by Polymer Fibers

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