trapping, [5] single-molecule analysis, [6,7] surface plasmon (SP) enhanced spectroscopy. [6,8,9] To achieve the extremely concentrated and strong electric fields, lots of efforts are contributed to fabricate kinds of plasmonic structures, revealing that sub-10 nm nanogap and nanotip are the two key characteristics. [10,11] In theory, as predicted by Maxwell's equations, the electric fields would become stronger with the decreasing distance between metal nanostructures and can be confined in the gaps; [12][13][14][15][16][17][18][19][20][21] for nanotips, more electrons are distributed at the structural features with high curvature and thus lead to stronger electric fields. [22][23][24][25][26][27][28][29][30] Various plasmonic nanostructures with either nanogaps or nanotips have been fabricated, successfully enhancing the electric fields to several orders of magnitude and confining them in extremely small areas. To obtain better performances, a natural thought is to include both nanogaps and nanotips in one plasmonic nanostructure, i.e., integrated "hot spots." Impressive efforts have been made to develop the multifeature nanostructures. For example, spilt-wedge antenna structures with sub-5 nm gaps, [10] 3D sub-10 nm nanostar dimers gap, [6] and 3D sub-10 nm Ag/SiN x gap with an pair of uniform tips, [31] have been fabricated and highly boosted the local optical field intensity. The fabrication of most these structures has primarily relied on electron beam lithography (EBL) [6,[32][33][34] and focused-ion beam (FIB). [35] These techniques can facilely control the patterns and precisely tune the size and separation, but they suffer from the drawbacks of high-cost, time-consuming, and low-throughput. It is urgently needed to develop a simple and scalable process for their production.Nanoskiving, that combines the deposition of thin metal layers on substrates (flat or structured) and sectioning using a unity of ultramicrotome and diamond knife, would be an alternative fabrication technique for plasmonic nanostructures with both nanogaps and nanotips. [36][37][38][39] Compared with the conventional fabrication techniques (EBL and FIB), nanoskiving is uncomplicated, fast, and scalable, requiring no sophisticated equipment. Nanoskiving has been widely used in fabricating numerous nanostructures, showing the strong capability for nanostructures on-demand. In particular, our research group has reported 3D zig-zag nanowires that possess both nanogaps and nanotips via combining photolithography Plasmonic crescent nanogap arrays (CNGAs) integrated by nanoscale gaps and nanotips exhibit strong capability of light confinement and thus lead to extremely electric field enhancement. The CNGAs with tunable gap-width are fabricated via a low-cost and simple process combining colloidal lithography and nanoskiving techniques. Incident light is captured in the nanogaps and at the two tips of nanocrescent, where extremely strong electric fields are excited. The strong electric fields lead to greatly enhanced surface-enhanced Raman s...