2019
DOI: 10.1002/chem.201901913
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A Porous POSiSil Suited for Pressure‐Driven Reversible Confinement of Solutions: PSS‐2

Abstract: Polyoligosiloxysilicone (POSiSil; designated PSS‐2) is a copolymer of double four‐ring (D4R) cyclosilicate and dimethylsiloxane. It is synthesized by linking D4R units in tetrabutylammonium cyclosilicate crystals with dimethyldichlorosilane. The structure of PSS‐2 was revealed using solid state NMR spectroscopy. In this 3D copolymer D4R units are connected systematically by short siloxane chains most likely composed of 2 to 3 dimethylsiloxane monomers. Controlling the conversion of the parent material allows f… Show more

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Cited by 6 publications
(14 citation statements)
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“…8. 182 After global compression of the material by 40% (Intrusion1 trace), reversible water intrusion-extrusion was obtained, with hysteresis characteristic of a shock absorber. Closure of the hysteresis loop and almost perfect overlap of intrusion and extrusion curves was observed in consecutive cycles.…”
Section: Turning Water Into a Tuneable Solvent -The Outlookmentioning
confidence: 99%
See 1 more Smart Citation
“…8. 182 After global compression of the material by 40% (Intrusion1 trace), reversible water intrusion-extrusion was obtained, with hysteresis characteristic of a shock absorber. Closure of the hysteresis loop and almost perfect overlap of intrusion and extrusion curves was observed in consecutive cycles.…”
Section: Turning Water Into a Tuneable Solvent -The Outlookmentioning
confidence: 99%
“…Fig.8. Water intrusion-extrusion cycles on (D4R-(DMS) 8) n silicone copolymer foam 182. Reprinted with permission from ref 105…”
mentioning
confidence: 99%
“…The resulting polymer would be hydrophobic due to the methyl groups on the silicone linkers. Chemically, it would be very similar to the polyoligosiloxysilicone (POSiSil) material family described in the previous research. , …”
Section: Introductionmentioning
confidence: 79%
“…Chemically, it would be very similar to the polyoligosiloxysilicone (POSiSil) material family described in the previous research. 22,49 In this work, the potential of the [Si 8 O 12 ][OSi(CH 3 ) 2 Cl] 8 spherosilicate to form hydrophobic POSiSil thin films on silicon wafers is evaluated. Silicon wafers were chosen as a substrate.…”
Section: ■ Introductionmentioning
confidence: 99%
“…27 PSS-2 is constituted using silicate D4R node (Si 8 O 20 ) and dimethylsilicone linkers. 56 Interconnecting octakis (dimethylsilyl chloride) spherosilicates using linear, aliphatic α,ω-alkanediols (ethylene glycol, 1,5-pentanediol, and 1,7-heptanediol) yield PSiPOPs; new reticular materials exploiting the chemistry of Si−Cl bonds and alcohol functional groups. nuclearity and exhibit the disadvantage of nonselective node synthesis.…”
Section: ■ Introductionmentioning
confidence: 99%