“…So far, numerous dividers based on different topologies and processes have been reported. Silicon-Germanium (SiGe) [11,12,13] and indium phosphide (InP) [14,15,16,17,18,19] are employed in many high-speed ECL dividers due to their high unity-gain (cut-off) frequency ( 𝑓 𝑡 ).In addition, several methods documented in the literature extend the operating frequency range of frequency dividers. These techniques include inductive peaking [20], split resistors [3], negative capacitance technology [21], and capacitive degeneration [22].In 1972, a differential implementation of the 𝑓 𝑡 -doubler structure was patented for the first time by Carl R. Batties [23], then it was applied in many field [24,25,26,27,28].…”