2019
DOI: 10.1063/1.5122274
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A powerful tool for comparing different test procedures to measure the probability and density of laser induced damage on optical materials

Abstract: The determination of the laser damage resistance of optics in the nanosecond regime is based on statistical tests and approaches because the response of the components is mainly related to the presence of defects randomly distributed in the optics and is therefore probabilistic in nature. For practical reasons, the tests are mostly carried out with beams of small dimensions (several tens of micrometer), that make it possible to determine a damage probability from which a laser damage threshold is extracted. Th… Show more

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Cited by 12 publications
(5 citation statements)
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“…Since the test range is higher than the design fluence of 2.5 J/cm 2 , a calculation of damage density is performed on the data and fit to a power law as a function of fluence, , following Ref. 20 . This fit is then used to extrapolate the expected damage density at operational fluences which are included in Table 1 .…”
Section: Methodsmentioning
confidence: 99%
“…Since the test range is higher than the design fluence of 2.5 J/cm 2 , a calculation of damage density is performed on the data and fit to a power law as a function of fluence, , following Ref. 20 . This fit is then used to extrapolate the expected damage density at operational fluences which are included in Table 1 .…”
Section: Methodsmentioning
confidence: 99%
“…Damage growth sequences were conducted on the laser damage setup MELBA [23]. Both surface and bulk images were acquired during growth experiments with tunable laser parameters.…”
Section: Methodsmentioning
confidence: 99%
“…Des traitements mathématiques tenant compte de la distribution de la population de défauts permettent de faire la correspondance entre les densités de dommages et les probabilités d'endommagement estimées par les différentes procédures. Plus de précisions sont données dans les références [3] et [4]. (partie par million), une largeur de bande interdite élevée (autour de 9eV pour la silice UV par exemple) et très peu d'impuretés.…”
Section: La Métrologie De L'endommagement Laserunclassified