2015
DOI: 10.1007/s10825-015-0710-4
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A pseudo 2-D surface potential model of a dual material double gate junctionless field effect transistor

Abstract: In this paper, we have developed a pseudo twodimensional (2-D) analytical model for the surface potential of a dual-material double-gate junctionless field-effect transistor. We have incorporated the effects of depletion into the source and drain regions to model the surface potential for all three operating modes: (a) full depletion, (b) partial depletion, and (c) near flatband. The effects of the device parameters such as oxide thickness, silicon thickness, and impurity concentration on the surface potential… Show more

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Cited by 17 publications
(14 citation statements)
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“…Around the flat‐band voltage, the carrier concentration in the channel is nearly N D . As the gate voltage increases, small amount of opposite charges accumulate at the surface . Using the Taylor's expansion of the exponential term, Equation is approximated to 2φ1italicABT0.12emi()xx2=q0.12emNDεitalicsi()φ1ABTixφnVth. …”
Section: Resultsmentioning
confidence: 99%
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“…Around the flat‐band voltage, the carrier concentration in the channel is nearly N D . As the gate voltage increases, small amount of opposite charges accumulate at the surface . Using the Taylor's expansion of the exponential term, Equation is approximated to 2φ1italicABT0.12emi()xx2=q0.12emNDεitalicsi()φ1ABTixφnVth. …”
Section: Resultsmentioning
confidence: 99%
“…As the gate voltage increases, small amount of opposite charges accumulate at the surface. 29 Using the Taylor's expansion of the exponential term, Equation 30 is approximated to…”
Section: Figurementioning
confidence: 99%
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“…It flows through the center of the channel i.e., volume conduction occurs due to the low concentration of the depletion charge carriers [10][11]. The necessity for materials with high work function (~5.6 eV) arises from turning the device properly OFF and lowering the subthreshold leakage current [12], which is technologically challenging. To overcome this problem, the use of dual material (DM) in the gate [1,4] was suggested, enhancing the electrostatic performance of the device by incorporating a step in the surface potential profile.…”
Section: Introductionmentioning
confidence: 99%
“…In 2014, Agarwal et al [12] proposed a pseudo-2-D surface potential model for dual material double gate junctionless field-effect transistor (DMDG-JLFET). Baruah et al [13] presented a study on analog circuit performance of a DMDG-JLFET with a high k-spacer.…”
Section: Introductionmentioning
confidence: 99%