2019
DOI: 10.1016/j.mee.2019.04.025
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A reconfigurable solid-state plasma dipole antenna based on SPiN diodes

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Cited by 4 publications
(1 citation statement)
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“…In designing of a solid-state plasma S-PIN diode, a critical consideration is whether the carrier concentration within the plasma region can reach 10 18 cm −3 under forward bias voltage. Several simulations and parameter optimizations have been conducted regarding the carrier concentration and I-V characteristics of the S-PIN diode structure [21][22][23][24][25]. Based on the research presented in these studies, it can be conclusively determined that highly resistive floating zone (FZ) silicon wafers are unsuitable for the fabrication of S-PIN diodes.…”
Section: Simulation and Analysis Of S-pin Diodesmentioning
confidence: 99%
“…In designing of a solid-state plasma S-PIN diode, a critical consideration is whether the carrier concentration within the plasma region can reach 10 18 cm −3 under forward bias voltage. Several simulations and parameter optimizations have been conducted regarding the carrier concentration and I-V characteristics of the S-PIN diode structure [21][22][23][24][25]. Based on the research presented in these studies, it can be conclusively determined that highly resistive floating zone (FZ) silicon wafers are unsuitable for the fabrication of S-PIN diodes.…”
Section: Simulation and Analysis Of S-pin Diodesmentioning
confidence: 99%