J. Photopol. Sci. Technol.
 2011
DOI: 10.2494/photopolymer.24.657
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A Resolution Enhancement Material for 193-nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl alcohol) with Uniform Resist Pattern Shrinkage

Koji Nozaki
1
,
Miwa Igarashi
2
,
Ei Yano
3
et al.
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