StranskiâKrastanov
(SK) growth mode is widely adopted for
the self-assembled growth of semiconductor quantum dots (QDs), wherein
a relatively large critical thickness is essential and a thick wetting
layer (WL) is formed beneath the QD layer. In this paper, we report
the metal organic vapor phase epitaxy of green InGaN QDs, employing
a growth interruption method to decrease the critical thickness and
improve the morphology of QDs. The QDs exhibit similar photoluminescence
properties with those grown by conventional SK mode, implying the
existence of a WL. We experimentally verify that the formation of
QDs, whether based on the SK mode or the growth interruption method,
conforms to the phase separation theory. However, the density of QDs
grown by the interruption method exhibits abnormal dependence on the
strain when a quantum well (QW) is inserted beneath the QD layer.
Furthermore, the underlying QW not only influences the morphology
of the QDs but also plays as a reservoir of electrons, which helps
enhance the photoluminescence and the electroluminescence of the QDs.
The method of QD growth with improved morphology and luminescence
by introducing the QWâQD coupled nanostructure is universally
applicable to similar material systems. Furthermore, a 550 nm green
light-emitting diode (LED) and a 526 nm superluminescent LED based
on the nanostructure are demonstrated.