2021
DOI: 10.1016/j.microrel.2021.114183
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A self-adaptive DBSCAN-based method for wafer bin map defect pattern classification

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Cited by 6 publications
(2 citation statements)
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“…The improved Harmony search algorithm (HS) was also used to optimize DBSCAN, when KDBSCAN combined with HS to optimize the clustering parameters Eps and MinPts [20]. Chin et al [21], proposed the use of DBSCAN as a Self-Adaptive DBSCAN-based method for solving a problem with wafer bin map such as the noise point detection of wafer maps (DBSCANWBM).…”
Section: Processmentioning
confidence: 99%
“…The improved Harmony search algorithm (HS) was also used to optimize DBSCAN, when KDBSCAN combined with HS to optimize the clustering parameters Eps and MinPts [20]. Chin et al [21], proposed the use of DBSCAN as a Self-Adaptive DBSCAN-based method for solving a problem with wafer bin map such as the noise point detection of wafer maps (DBSCANWBM).…”
Section: Processmentioning
confidence: 99%
“…This method can avoid manual intervention and realize adaptive parameter optimization in the clustering process; however, the algorithm also needs to manually adjust the size of minPts. In [44], a new algorithm, SA-DBSCANWBM, was proposed. This method selects a comprehensive index of clustered intra-cluster density and inter-cluster density to evaluate the optimal parameters.…”
Section: Introductionmentioning
confidence: 99%