2016
DOI: 10.1021/acsami.6b05261
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A Semitransparent and Flexible Single Crystal Si Thin Film: Silicon on Nothing (SON) Revisited

Abstract: Ultrathin single crystal Si films offer a versatile vehicle for high performance flexible and semitransparent electric devices due to their outstanding optoelectric and mechanical properties. Here, we demonstrate the formation of an ultrathin (100) single crystal Si film based on morphological evolution of nanoporous Si during high temperature annealing. Square arrays of cylindrical Si pores are formed by nanoimprint lithography and deep reactive etching and then subjected to annealing in hydrogen ambient. By … Show more

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Cited by 12 publications
(10 citation statements)
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“…The cylindrical pores arranged in square arrays are patterned on a Ge substrate using nanoimprint lithography (NIL) and reactive ion etching for well-ordered and sub-micron-scaled pore fabrication, as we demonstrated in SON technology. 23 The cylindrical Ge pores are then annealed in hydrogen for reorganization into the GON structure. As illustrated in Figures 1F and 1G, the final shape of the GON structure can be varied by the initial morphology of the Ge pores.…”
Section: Context and Scalementioning
confidence: 99%
“…The cylindrical pores arranged in square arrays are patterned on a Ge substrate using nanoimprint lithography (NIL) and reactive ion etching for well-ordered and sub-micron-scaled pore fabrication, as we demonstrated in SON technology. 23 The cylindrical Ge pores are then annealed in hydrogen for reorganization into the GON structure. As illustrated in Figures 1F and 1G, the final shape of the GON structure can be varied by the initial morphology of the Ge pores.…”
Section: Context and Scalementioning
confidence: 99%
“…The individual cavities formed in the initial annealing stage are utilized as photonic crystals 9 , the merged cavities are utilized as absolute pressure sensors by deflection of the membrane 10 – 12 and flow channels for microcapillaries and resonators 13 15 . Other applications that value the cavity’s peripherals remove and handle the self-assembled membrane in a separate manner to fabricate solar cells 4 , 16 , 17 and semitransparent silicon films 18 . Appropriate employment of these devices from SON and GON structures require a precise degree of cavity saturation, with specific morphologies of both surface and sub-surface structures.…”
Section: Introductionmentioning
confidence: 99%
“…This work uses surface-fitted polynomial coefficients as the extracted features of the surface topography pattern, and will focus on GON structures. Annealed with the same initial pattern, GON and SON structures are known to temporally transform in a similar fashion 4 , 18 . Namely, annealing a 2-D lattice patterned initial structure yields either spherical voids or plate-shaped voids depending on the diameter, pitch, and depth of the initial pattern.…”
Section: Introductionmentioning
confidence: 99%
“…The individual cavities formed in the initial annealing are utilized as photonic crystals 8 , the merged cavities are utilized as absolute pressure sensors by deflection of the membrane [9][10][11] , and flow channels as microcapillaries and resonators [12][13][14] . Other applications that value the cavity's peripherals remove and handle the self-assembled membrane in a separate manner to fabricate solar cells 4,15,16 and semitransparent silicon films 17 . Appropriate employment of these devices from SON and GON structures require a precise degree of cavity saturation, with specific morphologies of both surface and sub-surface structures.…”
Section: Introductionmentioning
confidence: 99%
“…This work uses surface-fitted polynomial coefficients as the extracted features of the surface topography pattern, and will focus on GON structures. Annealed with the same initial pattern, GON and SON structures are known to temporally transform in a similar fashion 4,17 . Namely, annealing a 2-D lattice patterned initial structure yields either spherical voids or plate-shaped voids depending on the diameter, pitch, and depth of the initial pattern.…”
Section: Introductionmentioning
confidence: 99%