2023
DOI: 10.1063/5.0137678
|View full text |Cite
|
Sign up to set email alerts
|

A short high-gain waveguide amplifier based on low concentration erbium-doped thin-film lithium niobate on insulator

Abstract: One hotspot of integrated optics is how to realize a highly integrated and high-gain on-chip amplification system in a thin film of lithium niobate on insulator (TFLNOI). Here, a low erbium-doped TFLNOI waveguide amplifier with shorter length is demonstrated using the photolithography-assisted oblique-reactive ion etching technique. A maximum net internal gain of 5.4 dB in the small-signal-gain regime is measured at the peak emission wavelength of 1531.35 nm for a waveguide length of 1.5 mm and an erbium-doped… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 8 publications
references
References 29 publications
0
0
0
Order By: Relevance