2003
DOI: 10.1109/jssc.2002.807414
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A single-V/sub t/ low-leakage gated-ground cache for deep submicron

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Cited by 117 publications
(96 citation statements)
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“…If the voltage on this node is raised when the cell is not accessed, the signal rail V H -V L is reduced lowering the subthreshold leakage current. In order to raise the voltage of node L and to disconnect it from the physical ground, a gated-ground NMOS transistor may be inserted in the pulldown path [2] (fig 2a). During the idle time, this transistor is off and the leakage mechanisms inside the cell are responsible for charging L. At the same time, the voltage of the node storing "0" rises as well and reaches a saturated value.…”
Section: Leakage Reduction Techniquementioning
confidence: 99%
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“…If the voltage on this node is raised when the cell is not accessed, the signal rail V H -V L is reduced lowering the subthreshold leakage current. In order to raise the voltage of node L and to disconnect it from the physical ground, a gated-ground NMOS transistor may be inserted in the pulldown path [2] (fig 2a). During the idle time, this transistor is off and the leakage mechanisms inside the cell are responsible for charging L. At the same time, the voltage of the node storing "0" rises as well and reaches a saturated value.…”
Section: Leakage Reduction Techniquementioning
confidence: 99%
“…The cell access delay is referred only to the discharge time of BL or BL during a reading operation and it is defined as the delay between the time at which the input signal of the wordline driver (WL' in fig 2) is V DD /2 and the voltage difference between BL and BL becomes V DD /10 [9]. Techniques [2] and [4] show an increased access delay because they both introduce an NMOS transistor in the pulldown network of the cell. For technique [2] the transition latency is zero because the delay in switching the cell into the sleep or active mode is taken into account in the cell access delay.…”
Section: Access Delay and Energy Savings Analysismentioning
confidence: 99%
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