2018
DOI: 10.1109/ted.2017.2786160
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A Smooth EKV-Based DC Model for Accurate Simulation of Printed Transistors and Their Process Variations

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Cited by 30 publications
(12 citation statements)
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“…The main objective of this section is to check the suitability of our model (1) and (10), in combination with the evolutionary algorithm [36], to characterize single-channel-length OTFTs with Schottky-limited contacts. To do this, we propose the following four experiments, grouped into two different evolutionary configurations: (A1) the evolutionary procedure uses (1) and (10), and (A2) the procedure uses (1) and (9). First, these two configurations perform a single-transistor parameter extraction [36] (Experiments A1-1 and A2-1).…”
Section: Experiments A: Schottky-limited Contactsmentioning
confidence: 99%
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“…The main objective of this section is to check the suitability of our model (1) and (10), in combination with the evolutionary algorithm [36], to characterize single-channel-length OTFTs with Schottky-limited contacts. To do this, we propose the following four experiments, grouped into two different evolutionary configurations: (A1) the evolutionary procedure uses (1) and (10), and (A2) the procedure uses (1) and (9). First, these two configurations perform a single-transistor parameter extraction [36] (Experiments A1-1 and A2-1).…”
Section: Experiments A: Schottky-limited Contactsmentioning
confidence: 99%
“…These values are collected in Table 1. They are introduced in (1) and (10) or in (1) and (9) to calculate the numerical output characteristics. Finally, they are compared to the experimental output characteristics and the Normalized Root Mean Squared Error (NRMSE [64]) are computed.…”
Section: Experiments A: Schottky-limited Contactsmentioning
confidence: 99%
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“…The later discussed circuit properties can be deduced on the basis of the transistor properties. [16,[41][42][43] To achieve high performance EGFETs, the indium oxide films need to be annealed at temperatures around 400 °C. In the past, it has been shown that these EGFETs perform reliably over a wide temperature range.…”
Section: Electrolyte-gated Field-effect Transistors Based On Indium Omentioning
confidence: 99%
“…[40] The EGFETs were also successfully modeled and integrated into a process design kit (PDK), which supports the circuit design flow. [16,[41][42][43] To achieve high performance EGFETs, the indium oxide films need to be annealed at temperatures around 400 °C. [44] By using chemical or photonic curing methods, the indium oxide film can be cured also at room temperatures.…”
Section: Electrolyte-gated Field-effect Transistors Based On Indium Omentioning
confidence: 99%