A spectrophotometric study of ruthenium‐1,2,3‐benzotriazole complexes

Wilson, Ray F.

doi:10.1002/zaac.19623180502

Cited by 3 publications

(1 citation statement)

References 7 publications

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“…24,39 Ru-BTA complexes are often found in ionic forms, and hence are likely to be water soluble, if they are generated in the CMP environment. 40,41 In addition, the chemisorbing anions (CO 3 2− /HCO 3 2−) can further change the chemical makeup and/or the structural integrity of the BTA complexes of both Cu and Ru. The observed trends of the plots in Fig.…”

Section: Resultsmentioning

confidence: 99%

Investigation of Percarbonate Based Slurry Chemistry for Controlling Galvanic Corrosion during CMP of Ruthenium

Türk¹,

Rock²,

Amanapu

et al. 2013

ECS J. Solid State Sci. Technol.

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Chemical mechanical planarization (CMP) of Ru barrier lines is expected to become a critical processing step in the fabrication of the new interconnect-structures. However, due to its noble metal characteristics, Ru induces galvanic corrosion in its adjacent Cu lines in the wet CMP environment, and resists chemical surface modifications that are necessary to support CMP. The present work reports a slurry formulation to address these challenges of Ru-CMP, and explores the considerations for residual Cu removal using the same slurry. This alkaline (pH = 10) slurry with colloidal silica abrasives uses sodium percarbonate as an oxidizer/complexing agent in the CMP of both Ru and Cu. L-ascorbic acid is employed as a surface modifier to regulate the material removal rates of CMP, and benzotriazole is used to control galvanic corrosion of the Ru-Cu couple. With this slurry, wafer polish rates of ∼10 and ∼80 nm min−1 are measured for Ru and Cu, respectively, resulting in defect-free processed samples. Electrochemical measurements of open circuit potentials, potentiodynamic polarization and impedance spectroscopy are performed to investigate the detailed surface reactions of Ru and Cu that facilitate material removal and control corrosion during the CMP of these metals.

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