2019
DOI: 10.33079/jomm.20030104
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A Study of 2D Assist Feature Placement

Abstract: 5 nm logic process is the current leading-edge technology which is under development in world-wide leading foundries. In a typical 5 nm logic process, the Fin pitch is 22~27 nm, the contact-poly pitch (CPP) is 48~55 nm, and the minimum metal pitch (MPP) is around 30~36 nm. Due to the fact that these pitches are much smaller than the resolution capability of 193 nm immersion lithography, it is also the first generation which adopts EUV photolithography technology on a large-scale where the process flow can be s… Show more

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